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Results for High-k Dielectrics

Publications & Outputs

  1. Solution-processed metal oxide dielectrics and semiconductors for thin film transistor applications

    Afouxenidis, D., 2018, Lancaster University. 297 p.

    Research output: ThesisDoctoral Thesis

  2. Solution processed lanthanum aluminate gate dielectrics for use in metal oxide-based thin film transistors

    Bin Esro, M., Mazzocco, R., Vourlias, G., Kolosov, O., Milne, W. I. & Adamopoulos, G., 22/05/2015, In : Applied Physics Letters. 106, 5 p., 203507.

    Research output: Contribution to journalJournal article

  3. ZnO-based thin film transistors employing aluminum titanate gate dielectrics deposited by spray pyrolysis at ambient air

    Afouxenidis, D., Mazzocco, R., Vourlias, G., Livesley, P., Krier, A., Milne, W. I., Kolosov, O. & Adamopoulos, G., 8/04/2015, In : ACS Applied Materials and Interfaces. 7, 13, p. 7334-7341 8 p.

    Research output: Contribution to journalJournal article

  4. Low-voltage ZnO thin-film transistors employing Nd2O3 high-k dielectrics deposited by spray pyrolysis in air

    Bin Esro, M., Kolosov, O., Vourlias, G., Krier, A., Milne, W. I. & Adamopoulos, G., 2015.

    Research output: Contribution to conference - Without ISBN/ISSN Poster

  5. Solution processed a-LaAlO3 gate dielectrics for their applications in thin film transistors employing metal oxide semiconducting channels

    Bin Esro, M., Mazzocco, R., Vourlias, G., Krier, A., Milne, W. I., Kolosov, O. & Adamopoulos, G., 2015.

    Research output: Contribution to conference - Without ISBN/ISSN Poster