Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSN › Conference contribution/Paper › peer-review
| Publication date | 2004 |
|---|---|
| Host publication | ASDAM 2004: The Fifth International Conference on Advanced Semiconductor Devices and Microsystems |
| Editors | J Osvald, S Hascik |
| Place of Publication | New York |
| Publisher | IEEE |
| Pages | 203-206 |
| Number of pages | 4 |
| ISBN (print) | 0-7803-8535-7 |
| <mark>Original language</mark> | English |
| Event | 5th International Conference on Advanced Semiconductor Devices and Microsystems - Smolenice Duration: 17/10/2004 → 21/10/2004 |
| Conference | 5th International Conference on Advanced Semiconductor Devices and Microsystems |
|---|---|
| City | Smolenice |
| Period | 17/10/04 → 21/10/04 |
| Conference | 5th International Conference on Advanced Semiconductor Devices and Microsystems |
|---|---|
| City | Smolenice |
| Period | 17/10/04 → 21/10/04 |
Anisotropic and isotropic etchants are very useful in preparation of InAs based devices. Polycarboxylic acids are very interesting as structural and selective etchants and Br-2-based systems have been found to give good results for chemical polishing and etching of A3B5 semiconductors. We investigated both systems with a view towards applications in InAs based optoelectronic devices.