Home > Research > Publications & Outputs > Thermal conductivity measurement of suspended S...

Links

Text available via DOI:

View graph of relations

Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Published
  • Hossein Ftouni
  • Christophe Blanc
  • A. Sikora
  • J. Richard
  • M. Defoort
  • Kunal Lulla
  • Eddy Collin
  • Olivier Bourgeois
Close
Article number012109
<mark>Journal publication date</mark>2012
<mark>Journal</mark>Journal of Physics: Conference Series
Volume395
Number of pages8
Publication StatusPublished
<mark>Original language</mark>English

Abstract

The thermal properties of suspended thin films prepared by the micro-machining process have been measured using the 3ω dynamic method coupled to a Völklein geometry. A transducer (heater/thermometer) centered on the membrane is driven by an ac current causing periodic thermal oscillations. The measurement of the temperature oscillation on the membrane is made at the third harmonic using a Wheatstone bridge set up. Here by coupling the 3ω method to a Völklein geometry (suspended membrane) we obtained a highly sensitive technique to measure the thermal conductance with a resolution of (ΔK/K = 10−3) and a sensitivity of the order of nanoWatt/K, thanks to a very sensitive niobium nitride thermometry. This method is applied to measure the in-plane thermal conductivity of 100 nm silicon nitride membrane, in the temperature range of 10–275 K.