Research output: Contribution to journal › Journal article
|Journal publication date||08/2011|
|Journal||Solid State Communications|
|Number of pages||6|
Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide. Crown Copyright (C) 2011 Published by Elsevier Ltd. All rights reserved.