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Engineering and metrology of epitaxial graphene

Research output: Contribution to journalJournal article

Published

  • Alexander Tzalenchuk
  • Samuel Lara-Avila
  • Karin Cedergren
  • Mikael Syvajarvi
  • Rositza Yakimova
  • Olga Kazakova
  • T. J. B. M. Janssen
  • Kasper Moth-Poulsen
  • Thomas Bjornholm
  • Sergey Kopylov
  • Vladimir Falko
  • Sergey Kubatkin
Journal publication date08/2011
JournalSolid State Communications
Journal number16
Volume151
Number of pages6
Pages1094-1099
Original languageEnglish

Abstract

Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.