Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
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TY - JOUR
T1 - Excitation energy transfer rate from Langmuir Blodgett (LB) dye monolayers to silicon: Effect of aggregate formation
AU - Danos, Lefteris
AU - Markvart, Tomas
PY - 2010/4/26
Y1 - 2010/4/26
N2 - Time-resolved emission spectra (TRES) and decay curves have been recorded from mixed LB oxacarbocyanine dye monolayers and stearic acid at different distances to the silicon surface. We observe interlayer energy transfer between monomers and dimers present in the monolayer competing directly with energy transfer to silicon at close distances. We resolve these competing processes by studying the TRES spectra and decompose them into their emission components. We found the energy transfer rate for the monomer to silicon to be double than that of the dimer at a distance of d similar to 5 nm to the silicon surface. The Forster radius for the energy transfer to silicon was estimated at 5.5 +/- 0.5 nm. (C) 2010 Elsevier B.V. All rights reserved.
AB - Time-resolved emission spectra (TRES) and decay curves have been recorded from mixed LB oxacarbocyanine dye monolayers and stearic acid at different distances to the silicon surface. We observe interlayer energy transfer between monomers and dimers present in the monolayer competing directly with energy transfer to silicon at close distances. We resolve these competing processes by studying the TRES spectra and decompose them into their emission components. We found the energy transfer rate for the monomer to silicon to be double than that of the dimer at a distance of d similar to 5 nm to the silicon surface. The Forster radius for the energy transfer to silicon was estimated at 5.5 +/- 0.5 nm. (C) 2010 Elsevier B.V. All rights reserved.
KW - SEMICONDUCTOR
KW - RESOLVED FLUORESCENCE
KW - INTERFACES
KW - CRYSTALS
KW - MODE
KW - FILMS
UR - http://www.scopus.com/inward/record.url?scp=77950862753&partnerID=8YFLogxK
U2 - 10.1016/j.cplett.2010.03.045
DO - 10.1016/j.cplett.2010.03.045
M3 - Journal article
VL - 490
SP - 194
EP - 199
JO - Chemical Physics Letters
JF - Chemical Physics Letters
SN - 0009-2614
IS - 4-6
ER -