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Method for deposition of ceramic films

Research output: Patent


Patent numberWO2009090419 (A2)
IPCC04B41/87; C04B41/89; C23C18/12; H01M8/12
<mark>Original language</mark>English


The present invention is concerned with methods for the deposition of ceramic films on ceramic or metallic surfaces, particularly the deposition of sub-micron thickness ceramic films such as films of stabilised zirconia and doped ceria such as CGO (cerium gadolinium oxide). The present invention is particularly useful in the manufacture of high and intermediate temperature SOFC operating in the 450degC to 650degC range.