Quantum resistance metrology using graphene

Physics

Research output: Contribution to Journal/Magazine › Literature review › peer-review

Published

Standard

Quantum resistance metrology using graphene. / Janssen, T. J. B. M.; Tzalenchuk, A.; Lara-Avila, S. et al.
In: Reports on Progress in Physics, Vol. 76, No. 10, 104501, 03.10.2013.

Research output: Contribution to Journal/Magazine › Literature review › peer-review

Harvard

Janssen, TJBM, Tzalenchuk, A, Lara-Avila, S, Kubatkin, S & Falko, V 2013, 'Quantum resistance metrology using graphene', Reports on Progress in Physics, vol. 76, no. 10, 104501. https://doi.org/10.1088/0034-4885/76/10/104501

APA

Janssen, T. J. B. M., Tzalenchuk, A., Lara-Avila, S., Kubatkin, S., & Falko, V. (2013). Quantum resistance metrology using graphene. Reports on Progress in Physics, 76(10), Article 104501. https://doi.org/10.1088/0034-4885/76/10/104501

Vancouver

Janssen TJBM, Tzalenchuk A, Lara-Avila S, Kubatkin S, Falko V. Quantum resistance metrology using graphene. Reports on Progress in Physics. 2013 Oct 3;76(10):104501. doi: 10.1088/0034-4885/76/10/104501

Author

Janssen, T. J. B. M. ; Tzalenchuk, A. ; Lara-Avila, S. et al. / Quantum resistance metrology using graphene. In: Reports on Progress in Physics. 2013 ; Vol. 76, No. 10.

Bibtex

@article{7d63c38dbff04985988edbf2b7b84e36,

title = "Quantum resistance metrology using graphene",

abstract = "In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.",

keywords = "QUANTIZED HALL RESISTANCE, EPITAXIAL GRAPHENE, ELECTRICAL METROLOGY, GALLIUM-ARSENIDE, CAPACITANCE, GAS, STANDARDS, FIELD, CONDUCTANCE, CONSTANTS",

author = "Janssen, {T. J. B. M.} and A. Tzalenchuk and S. Lara-Avila and S. Kubatkin and Vladimir Falko",

year = "2013",

month = oct,

day = "3",

doi = "10.1088/0034-4885/76/10/104501",

language = "English",

volume = "76",

journal = "Reports on Progress in Physics",

issn = "0034-4885",

publisher = "IOP Publishing Ltd.",

number = "10",

}

RIS

TY - JOUR

T1 - Quantum resistance metrology using graphene

AU - Janssen, T. J. B. M.

AU - Tzalenchuk, A.

AU - Lara-Avila, S.

AU - Kubatkin, S.

AU - Falko, Vladimir

PY - 2013/10/3

Y1 - 2013/10/3

N2 - In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.

AB - In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.

KW - QUANTIZED HALL RESISTANCE

KW - EPITAXIAL GRAPHENE

KW - ELECTRICAL METROLOGY

KW - GALLIUM-ARSENIDE

KW - CAPACITANCE

KW - GAS

KW - STANDARDS

KW - FIELD

KW - CONDUCTANCE

KW - CONSTANTS

U2 - 10.1088/0034-4885/76/10/104501

DO - 10.1088/0034-4885/76/10/104501

M3 - Literature review

VL - 76

JO - Reports on Progress in Physics

JF - Reports on Progress in Physics

SN - 0034-4885

IS - 10

M1 - 104501

ER -

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