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Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors

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Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors. / Adamopoulos, George; Bashir, Aneeqa; Gillin, William P. et al.
In: Advanced Functional Materials, Vol. 21, No. 3, 08.02.2011, p. 525-531.

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Harvard

Adamopoulos, G, Bashir, A, Gillin, WP, Georgakopoulos, S, Shkunov, M, Baklar, MA, Stingelin, N, Bradley, DDC & Anthopoulos, TD 2011, 'Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors', Advanced Functional Materials, vol. 21, no. 3, pp. 525-531. https://doi.org/10.1002/adfm.201001089

APA

Adamopoulos, G., Bashir, A., Gillin, W. P., Georgakopoulos, S., Shkunov, M., Baklar, M. A., Stingelin, N., Bradley, D. D. C., & Anthopoulos, T. D. (2011). Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors. Advanced Functional Materials, 21(3), 525-531. https://doi.org/10.1002/adfm.201001089

Vancouver

Adamopoulos G, Bashir A, Gillin WP, Georgakopoulos S, Shkunov M, Baklar MA et al. Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors. Advanced Functional Materials. 2011 Feb 8;21(3):525-531. doi: 10.1002/adfm.201001089

Author

Adamopoulos, George ; Bashir, Aneeqa ; Gillin, William P. et al. / Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors. In: Advanced Functional Materials. 2011 ; Vol. 21, No. 3. pp. 525-531.

Bibtex

@article{2b88eb09ea0946cab2150d2bb041256e,
title = "Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors",
abstract = "The role of the substrate temperature on the structural, optical, and electronic properties of ZnO thin films deposited by spray pyrolysis using a zinc acetate precursor solution is reported. Analysis of the precursor compound using thermogravimentry and differential scanning calorimetry indicates complete decomposition of the precursor at around 350 degrees C. Film characterization using Fourier Transform Infrared Spectroscopy (FTIR), photoluminescence spectroscopy (PL), and ultraviolet-visible (UV-Vis) optical transmission spectroscopy suggests the onset of ZnO growth at temperatures as low as 100 degrees C as well as the transformation to a polycrystalline phase at deposition temperatures >200 degrees C. Atomic force microscopy (AFM) and X-ray diffraction (XRD) reveal that as-deposited films exhibit low surface roughness (rms approximate to 2.9 nm at 500 degrees C) and a crystal size that is monotonously increasing from 8 to 32 nm for deposition temperatures in the range of 200-500 degrees C. The latter appears to have a direct impact on the field-effect electron mobility, which is found to increase with increasing ZnO crystal size. The maximum mobility and current on/off ratio is obtained from thin-film transistors fabricated using ZnO films deposited at >400 degrees C yielding values on the order of 25 cm(2) V(-1)s(-1) and 10(6), respectively.",
keywords = "Zinc Oxide, Thin-Film Transistors, Spray Pyrolysis , Transparent Electronics , Solution Processing",
author = "George Adamopoulos and Aneeqa Bashir and Gillin, {William P.} and Stamatis Georgakopoulos and Maxim Shkunov and Baklar, {Mohamed A.} and Natalie Stingelin and Bradley, {Donal D. C.} and Anthopoulos, {Thomas D.}",
year = "2011",
month = feb,
day = "8",
doi = "10.1002/adfm.201001089",
language = "English",
volume = "21",
pages = "525--531",
journal = "Advanced Functional Materials",
issn = "1616-301X",
publisher = "John Wiley & Sons, Ltd",
number = "3",

}

RIS

TY - JOUR

T1 - Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin-Film Transistors

AU - Adamopoulos, George

AU - Bashir, Aneeqa

AU - Gillin, William P.

AU - Georgakopoulos, Stamatis

AU - Shkunov, Maxim

AU - Baklar, Mohamed A.

AU - Stingelin, Natalie

AU - Bradley, Donal D. C.

AU - Anthopoulos, Thomas D.

PY - 2011/2/8

Y1 - 2011/2/8

N2 - The role of the substrate temperature on the structural, optical, and electronic properties of ZnO thin films deposited by spray pyrolysis using a zinc acetate precursor solution is reported. Analysis of the precursor compound using thermogravimentry and differential scanning calorimetry indicates complete decomposition of the precursor at around 350 degrees C. Film characterization using Fourier Transform Infrared Spectroscopy (FTIR), photoluminescence spectroscopy (PL), and ultraviolet-visible (UV-Vis) optical transmission spectroscopy suggests the onset of ZnO growth at temperatures as low as 100 degrees C as well as the transformation to a polycrystalline phase at deposition temperatures >200 degrees C. Atomic force microscopy (AFM) and X-ray diffraction (XRD) reveal that as-deposited films exhibit low surface roughness (rms approximate to 2.9 nm at 500 degrees C) and a crystal size that is monotonously increasing from 8 to 32 nm for deposition temperatures in the range of 200-500 degrees C. The latter appears to have a direct impact on the field-effect electron mobility, which is found to increase with increasing ZnO crystal size. The maximum mobility and current on/off ratio is obtained from thin-film transistors fabricated using ZnO films deposited at >400 degrees C yielding values on the order of 25 cm(2) V(-1)s(-1) and 10(6), respectively.

AB - The role of the substrate temperature on the structural, optical, and electronic properties of ZnO thin films deposited by spray pyrolysis using a zinc acetate precursor solution is reported. Analysis of the precursor compound using thermogravimentry and differential scanning calorimetry indicates complete decomposition of the precursor at around 350 degrees C. Film characterization using Fourier Transform Infrared Spectroscopy (FTIR), photoluminescence spectroscopy (PL), and ultraviolet-visible (UV-Vis) optical transmission spectroscopy suggests the onset of ZnO growth at temperatures as low as 100 degrees C as well as the transformation to a polycrystalline phase at deposition temperatures >200 degrees C. Atomic force microscopy (AFM) and X-ray diffraction (XRD) reveal that as-deposited films exhibit low surface roughness (rms approximate to 2.9 nm at 500 degrees C) and a crystal size that is monotonously increasing from 8 to 32 nm for deposition temperatures in the range of 200-500 degrees C. The latter appears to have a direct impact on the field-effect electron mobility, which is found to increase with increasing ZnO crystal size. The maximum mobility and current on/off ratio is obtained from thin-film transistors fabricated using ZnO films deposited at >400 degrees C yielding values on the order of 25 cm(2) V(-1)s(-1) and 10(6), respectively.

KW - Zinc Oxide

KW - Thin-Film Transistors

KW - Spray Pyrolysis

KW - Transparent Electronics

KW - Solution Processing

U2 - 10.1002/adfm.201001089

DO - 10.1002/adfm.201001089

M3 - Journal article

VL - 21

SP - 525

EP - 531

JO - Advanced Functional Materials

JF - Advanced Functional Materials

SN - 1616-301X

IS - 3

ER -