Home > Research > Publications & Outputs > Study of interfacial film growth with ac measur...
View graph of relations

Study of interfacial film growth with ac measurements

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Published

Standard

Study of interfacial film growth with ac measurements. / Mertens, S.F.L.; Temmerman, E.
In: Journal of Colloid and Interface Science, Vol. 227, No. 2, 2000, p. 517-524.

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Harvard

Mertens, SFL & Temmerman, E 2000, 'Study of interfacial film growth with ac measurements', Journal of Colloid and Interface Science, vol. 227, no. 2, pp. 517-524. https://doi.org/10.1006/jcis.2000.6853

APA

Mertens, S. F. L., & Temmerman, E. (2000). Study of interfacial film growth with ac measurements. Journal of Colloid and Interface Science, 227(2), 517-524. https://doi.org/10.1006/jcis.2000.6853

Vancouver

Mertens SFL, Temmerman E. Study of interfacial film growth with ac measurements. Journal of Colloid and Interface Science. 2000;227(2):517-524. doi: 10.1006/jcis.2000.6853

Author

Mertens, S.F.L. ; Temmerman, E. / Study of interfacial film growth with ac measurements. In: Journal of Colloid and Interface Science. 2000 ; Vol. 227, No. 2. pp. 517-524.

Bibtex

@article{726d2cbe8fc7452eb06cad95e4941f8b,
title = "Study of interfacial film growth with ac measurements",
abstract = "The relevance of ac measurements for the study of developing films at solid-liquid interfaces is discussed. An electrical model is introduced, and the correspondence of each circuit element with a chemical or physical process is explained. Further details are discussed mostly by considering the spontaneous development of a solid film at a Zn/CrO3(aq) interface. It is shown that less straightforward ac behavior may be understood after modification of the general electrical model, based on supplementary information on the studied system. For the experimental system considered, the most important film growth characteristics are derived. (C) 2000 Academic Press.",
keywords = "Ac measurements, Impedance, Interfacial film growth, article, chemical analysis, derivatization, electrochemistry, priority journal, reaction analysis, semiconductor, solid phase extraction, surface property",
author = "S.F.L. Mertens and E. Temmerman",
note = "Cited By :2 Export Date: 17 April 2019 CODEN: JCISA",
year = "2000",
doi = "10.1006/jcis.2000.6853",
language = "English",
volume = "227",
pages = "517--524",
journal = "Journal of Colloid and Interface Science",
issn = "0021-9797",
publisher = "Academic Press Inc.",
number = "2",

}

RIS

TY - JOUR

T1 - Study of interfacial film growth with ac measurements

AU - Mertens, S.F.L.

AU - Temmerman, E.

N1 - Cited By :2 Export Date: 17 April 2019 CODEN: JCISA

PY - 2000

Y1 - 2000

N2 - The relevance of ac measurements for the study of developing films at solid-liquid interfaces is discussed. An electrical model is introduced, and the correspondence of each circuit element with a chemical or physical process is explained. Further details are discussed mostly by considering the spontaneous development of a solid film at a Zn/CrO3(aq) interface. It is shown that less straightforward ac behavior may be understood after modification of the general electrical model, based on supplementary information on the studied system. For the experimental system considered, the most important film growth characteristics are derived. (C) 2000 Academic Press.

AB - The relevance of ac measurements for the study of developing films at solid-liquid interfaces is discussed. An electrical model is introduced, and the correspondence of each circuit element with a chemical or physical process is explained. Further details are discussed mostly by considering the spontaneous development of a solid film at a Zn/CrO3(aq) interface. It is shown that less straightforward ac behavior may be understood after modification of the general electrical model, based on supplementary information on the studied system. For the experimental system considered, the most important film growth characteristics are derived. (C) 2000 Academic Press.

KW - Ac measurements

KW - Impedance

KW - Interfacial film growth

KW - article

KW - chemical analysis

KW - derivatization

KW - electrochemistry

KW - priority journal

KW - reaction analysis

KW - semiconductor

KW - solid phase extraction

KW - surface property

U2 - 10.1006/jcis.2000.6853

DO - 10.1006/jcis.2000.6853

M3 - Journal article

VL - 227

SP - 517

EP - 524

JO - Journal of Colloid and Interface Science

JF - Journal of Colloid and Interface Science

SN - 0021-9797

IS - 2

ER -