Home > Research > Publications & Outputs > Study of the Secondary Electron Yield in Dielec...

Electronic data

  • Study of the Secondary Electron Yield in Dielectrics

    Rights statement: ©2018 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

    Accepted author manuscript, 1.57 MB, PDF document

    Available under license: CC BY-NC: Creative Commons Attribution-NonCommercial 4.0 International License

Links

Text available via DOI:

View graph of relations

Study of the Secondary Electron Yield in Dielectrics Using Equivalent Circuital Models

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Published
  • David Banón-Caballero
  • Juan Socuellamos
  • Rafael Mata
  • Laura Mercadé
  • Benito Gimeno
  • Vicente Boria
  • David Raboso
  • Vladimir Semenov
  • Elena Rakova
  • Juan Sánchez-Royo
  • Alfredo Segura
Close
<mark>Journal publication date</mark>04/2018
<mark>Journal</mark>IEEE Transactions on Plasma Science
Issue number4
Volume46
Number of pages9
Pages (from-to)859-867
Publication StatusPublished
Early online date8/03/18
<mark>Original language</mark>English

Abstract

Secondary electron emission has an important role on the triggering of the multipactor effect; therefore, its study and characterization are essential in radio-frequency waveguide applications. In this paper, we propose a theoretical model, based on equivalent circuit models, to properly understand charging and discharging processes that occur in dielectric samples under electron irradiation for secondary electron emission characterization. Experimental results obtained for Pt, Si, GaS, and Teflon samples are presented to verify the accuracy of the proposed model. Good agreement between theory and experiments has been found.

Bibliographic note

©2018 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.