Home > Research > Publications & Outputs > Synthesis of new polymers for photoresist and l...
View graph of relations

Synthesis of new polymers for photoresist and lithographic printing applications.

Research output: Contribution to journalJournal article

Published

Standard

Synthesis of new polymers for photoresist and lithographic printing applications. / Davidson, K.; El-Attawy, S.; El-Gamal, M.; Khattab, M. A.; El-Demerdach, A. M.

In: High Performance Polymers, Vol. 14, No. 1, 03.2002, p. 3-15.

Research output: Contribution to journalJournal article

Harvard

Davidson, K, El-Attawy, S, El-Gamal, M, Khattab, MA & El-Demerdach, AM 2002, 'Synthesis of new polymers for photoresist and lithographic printing applications.', High Performance Polymers, vol. 14, no. 1, pp. 3-15. https://doi.org/10.1177/0954008302014001091

APA

Davidson, K., El-Attawy, S., El-Gamal, M., Khattab, M. A., & El-Demerdach, A. M. (2002). Synthesis of new polymers for photoresist and lithographic printing applications. High Performance Polymers, 14(1), 3-15. https://doi.org/10.1177/0954008302014001091

Vancouver

Davidson K, El-Attawy S, El-Gamal M, Khattab MA, El-Demerdach AM. Synthesis of new polymers for photoresist and lithographic printing applications. High Performance Polymers. 2002 Mar;14(1):3-15. https://doi.org/10.1177/0954008302014001091

Author

Davidson, K. ; El-Attawy, S. ; El-Gamal, M. ; Khattab, M. A. ; El-Demerdach, A. M. / Synthesis of new polymers for photoresist and lithographic printing applications. In: High Performance Polymers. 2002 ; Vol. 14, No. 1. pp. 3-15.

Bibtex

@article{2da3b936a2c24f8f9f07a630fa8ae562,
title = "Synthesis of new polymers for photoresist and lithographic printing applications.",
abstract = "Lithographic resist materials based on copolymers and/or terpolymers have been synthesised. These materials are comprised of one component to induce water solubility, such as Nvinyl pyrrolidinone (NVP) or N, Ndimethyl acrylamide (DMAC); and another material to give the photoactive response, in this case allyl glycidyl ether (AGE) or glycidyl methacrylate (GMA). Copolymers and terpolymers of various compositions have been prepared by free radical copolymerization. Cationically initiated photocrosslinking was induced using mixed arylsulphonium hexaflouroantimonate (MAS+-SbF6) as a photoacid generating (PAG) species.",
author = "K. Davidson and S. El-Attawy and M. El-Gamal and Khattab, {M. A.} and El-Demerdach, {A. M.}",
year = "2002",
month = "3",
doi = "10.1177/0954008302014001091",
language = "English",
volume = "14",
pages = "3--15",
journal = "High Performance Polymers",
issn = "0954-0083",
publisher = "SAGE Publications Ltd",
number = "1",

}

RIS

TY - JOUR

T1 - Synthesis of new polymers for photoresist and lithographic printing applications.

AU - Davidson, K.

AU - El-Attawy, S.

AU - El-Gamal, M.

AU - Khattab, M. A.

AU - El-Demerdach, A. M.

PY - 2002/3

Y1 - 2002/3

N2 - Lithographic resist materials based on copolymers and/or terpolymers have been synthesised. These materials are comprised of one component to induce water solubility, such as Nvinyl pyrrolidinone (NVP) or N, Ndimethyl acrylamide (DMAC); and another material to give the photoactive response, in this case allyl glycidyl ether (AGE) or glycidyl methacrylate (GMA). Copolymers and terpolymers of various compositions have been prepared by free radical copolymerization. Cationically initiated photocrosslinking was induced using mixed arylsulphonium hexaflouroantimonate (MAS+-SbF6) as a photoacid generating (PAG) species.

AB - Lithographic resist materials based on copolymers and/or terpolymers have been synthesised. These materials are comprised of one component to induce water solubility, such as Nvinyl pyrrolidinone (NVP) or N, Ndimethyl acrylamide (DMAC); and another material to give the photoactive response, in this case allyl glycidyl ether (AGE) or glycidyl methacrylate (GMA). Copolymers and terpolymers of various compositions have been prepared by free radical copolymerization. Cationically initiated photocrosslinking was induced using mixed arylsulphonium hexaflouroantimonate (MAS+-SbF6) as a photoacid generating (PAG) species.

U2 - 10.1177/0954008302014001091

DO - 10.1177/0954008302014001091

M3 - Journal article

VL - 14

SP - 3

EP - 15

JO - High Performance Polymers

JF - High Performance Polymers

SN - 0954-0083

IS - 1

ER -