Final published version
Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
}
TY - JOUR
T1 - Electron diffraction using ultrafast electron bunches from a laser-wakefield accelerator at kHz repetition rate
AU - He, Z. -H.
AU - Thomas, A. G. R.
AU - Beaurepaire, B.
AU - Nees, J. A.
AU - Hou, B.
AU - Malka, V.
AU - Krushelnick, K.
AU - Faure, J.
PY - 2013/2/11
Y1 - 2013/2/11
N2 - We show that electron bunches in the 50-100 keV range can be produced from a laser wakefield accelerator using 10 mJ, 35 fs laser pulses operating at 0.5 kHz. It is shown that using a solenoid magnetic lens, the electron bunch distribution can be shaped. The resulting transverse and longitudinal coherence is suitable for producing diffraction images from a polycrystalline 10 nm aluminum foil. The high repetition rate, the stability of the electron source, and the fact that its uncorrelated bunch duration is below 100 fs make this approach promising for the development of sub-100 fs ultrafast electron diffraction experiments. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4792057]
AB - We show that electron bunches in the 50-100 keV range can be produced from a laser wakefield accelerator using 10 mJ, 35 fs laser pulses operating at 0.5 kHz. It is shown that using a solenoid magnetic lens, the electron bunch distribution can be shaped. The resulting transverse and longitudinal coherence is suitable for producing diffraction images from a polycrystalline 10 nm aluminum foil. The high repetition rate, the stability of the electron source, and the fact that its uncorrelated bunch duration is below 100 fs make this approach promising for the development of sub-100 fs ultrafast electron diffraction experiments. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4792057]
KW - ATOMIC MOTIONS
KW - PULSES
KW - FEMTOSECOND
KW - INJECTION
KW - PHASE
U2 - 10.1063/1.4792057
DO - 10.1063/1.4792057
M3 - Journal article
VL - 102
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 6
M1 - 064104
ER -