12,000

We have over 12,000 students, from over 100 countries, within one of the safest campuses in the UK

93%

93% of Lancaster students go into work or further study within six months of graduating

Home > Research > Publications & Outputs > MBE growth and characterization of dilute nitri...
View graph of relations

« Back

MBE growth and characterization of dilute nitrides for mid-infrared optoelectronic devices

Research output: Contribution to journalJournal article

Published

Journal publication date2011
JournalProceedings- Spie the International Society for Optical Engineering
Journal number79450L
Volume7945
Number of pages0
Original languageEnglish

Abstract

We report the molecular beam epitaxial growth of narrow gap dilute nitride InAsN alloys onto GaAs substrates using a nitrogen plasma source. The photoluminescence (PL) of InAsN alloys with N-content in the range 0 to 1% which exhibit emission in the mid-infrared spectral range is described. The sample containing 1% N reveals evidence of recombination from extended and localized states within the degenerate conduction band of InAsN. A comparison of GaAs and InAs based material shows little change in PL linewidth such that the change in substrate does not cause significant reduction in quality of the epilayers. The band gap dependence on N content in our material is consistent with predictions from the band anti-crossing model. We also report the growth of InAsSbN/InAs multi-quantum wells which exhibit bright PL up to a temperature of 250 K without any post growth annealing. Consideration of the power dependent PL behaviour is consistent with Type I band alignment arising from strong lowering of the conduction band edge due to N-induced band anti-crossing effects.