Home > Research > Publications & Outputs > Passivation of n-type silicon (111) surfaces by...
View graph of relations

Passivation of n-type silicon (111) surfaces by the attachment of charged molecules

Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSNConference contribution/Paperpeer-review

Published
Close
Publication date2012
Host publication2012 38th IEEE Photovoltaic Specialists Conference (PVSC)
Place of PublicationNew York
PublisherIEEE
Pages992-995
Number of pages4
ISBN (print)978-1-4673-0066-7
<mark>Original language</mark>English
Event38th IEEE Photovoltaic Specialists Conference (PVSC) - Austin
Duration: 3/06/20128/06/2012

Conference

Conference38th IEEE Photovoltaic Specialists Conference (PVSC)
CityAustin
Period3/06/128/06/12

Conference

Conference38th IEEE Photovoltaic Specialists Conference (PVSC)
CityAustin
Period3/06/128/06/12

Abstract

With the drive for ever more efficient photovoltaics, the passivating layer becomes of greater importance. Currently, two main passivating mechanisms have been widely investigated; removal of surface states by organic layers and charging of surfaces to invert the surface bands. Our paper aims to increase the knowledge of this area by combining the removal of surface states with charging, in an attempt to build ever more efficient passivation layers. It was found that upon immersion in base, the recombination lifetime significantly improved from around 8 mu s to over 30 mu s, due to a negative monolayer surface charge. As the charge is further from the silicon surface, both the recombination lifetime and surface photovoltage (SPV) decrease. This in turn indicates a reduction in the surface electron concentration. Once the surface charge is neutralized, both the recombination lifetime and SPV return to their starting value.