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Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1)

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Published

Standard

Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1). / Smith, Jeremy; Bashir, Aneeqa; Adamopoulos, George et al.
In: Advanced Materials, Vol. 22, No. 32, 24.08.2010, p. 3598-3602.

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Harvard

Smith, J, Bashir, A, Adamopoulos, G, Anthony, JE, Bradley, DDC, Hamilton, R, Heeney, M, McCulloch, I & Anthopoulos, TD 2010, 'Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1)', Advanced Materials, vol. 22, no. 32, pp. 3598-3602. https://doi.org/10.1002/adma.201000195

APA

Smith, J., Bashir, A., Adamopoulos, G., Anthony, J. E., Bradley, D. D. C., Hamilton, R., Heeney, M., McCulloch, I., & Anthopoulos, T. D. (2010). Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1). Advanced Materials, 22(32), 3598-3602. https://doi.org/10.1002/adma.201000195

Vancouver

Smith J, Bashir A, Adamopoulos G, Anthony JE, Bradley DDC, Hamilton R et al. Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1). Advanced Materials. 2010 Aug 24;22(32):3598-3602. doi: 10.1002/adma.201000195

Author

Smith, Jeremy ; Bashir, Aneeqa ; Adamopoulos, George et al. / Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1). In: Advanced Materials. 2010 ; Vol. 22, No. 32. pp. 3598-3602.

Bibtex

@article{7171828d001841bc9fa4e7e774056418,
title = "Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1)",
abstract = "An alternative approach for the development of high-performance unipolar and ambipolar thin-film transistors and integrated circuits based on hybrid heterostructures comprising a phase-separated solution processed p-type organic small-molecule:polymer semicondcutor blend and a spray-coated n-type ZnO semiconductor layer is demonstrated.",
keywords = "hybrid circuits, hybrid transistors, organic transistors , metal oxide semiconductors",
author = "Jeremy Smith and Aneeqa Bashir and George Adamopoulos and Anthony, {John E.} and Bradley, {Donal D. C.} and R. Hamilton and Martin Heeney and Iain McCulloch and Anthopoulos, {Thomas D.}",
year = "2010",
month = aug,
day = "24",
doi = "10.1002/adma.201000195",
language = "English",
volume = "22",
pages = "3598--3602",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "32",

}

RIS

TY - JOUR

T1 - Air-Stable Solution-Processed Hybrid Transistors with Hole and Electron Mobilities Exceeding 2 cm(2) V-1 s(-1)

AU - Smith, Jeremy

AU - Bashir, Aneeqa

AU - Adamopoulos, George

AU - Anthony, John E.

AU - Bradley, Donal D. C.

AU - Hamilton, R.

AU - Heeney, Martin

AU - McCulloch, Iain

AU - Anthopoulos, Thomas D.

PY - 2010/8/24

Y1 - 2010/8/24

N2 - An alternative approach for the development of high-performance unipolar and ambipolar thin-film transistors and integrated circuits based on hybrid heterostructures comprising a phase-separated solution processed p-type organic small-molecule:polymer semicondcutor blend and a spray-coated n-type ZnO semiconductor layer is demonstrated.

AB - An alternative approach for the development of high-performance unipolar and ambipolar thin-film transistors and integrated circuits based on hybrid heterostructures comprising a phase-separated solution processed p-type organic small-molecule:polymer semicondcutor blend and a spray-coated n-type ZnO semiconductor layer is demonstrated.

KW - hybrid circuits

KW - hybrid transistors

KW - organic transistors

KW - metal oxide semiconductors

U2 - 10.1002/adma.201000195

DO - 10.1002/adma.201000195

M3 - Journal article

VL - 22

SP - 3598

EP - 3602

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 32

ER -