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Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate

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Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate. / Qiu, Dong; Guerry, Paul; Knowles, Jonathan C. et al.
In: Journal of Sol-Gel Science and Technology, Vol. 48, No. 3, 12.2008, p. 378-383.

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Harvard

Qiu, D, Guerry, P, Knowles, JC, Smith, ME & Newport, RJ 2008, 'Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate', Journal of Sol-Gel Science and Technology, vol. 48, no. 3, pp. 378-383. https://doi.org/10.1007/s10971-008-1818-9

APA

Qiu, D., Guerry, P., Knowles, J. C., Smith, M. E., & Newport, R. J. (2008). Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate. Journal of Sol-Gel Science and Technology, 48(3), 378-383. https://doi.org/10.1007/s10971-008-1818-9

Vancouver

Qiu D, Guerry P, Knowles JC, Smith ME, Newport RJ. Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate. Journal of Sol-Gel Science and Technology. 2008 Dec;48(3):378-383. doi: 10.1007/s10971-008-1818-9

Author

Qiu, Dong ; Guerry, Paul ; Knowles, Jonathan C. et al. / Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate. In: Journal of Sol-Gel Science and Technology. 2008 ; Vol. 48, No. 3. pp. 378-383.

Bibtex

@article{62e6171252b043bdaf4645f7de02b92d,
title = "Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate",
abstract = "Phosphosilicate gels with high phosphorus content (P mol% > Si mol%) have been prepared using phytic acid as the phosphorus precursor, with tetraethyl orthosilicate (TEOS). It is shown that the structure of phytic acid is maintained in both the sols and those gels dried at a low temperature (i.e. ≤120 °C). Solid state 29Si and 31P NMR suggest that the gel network is primarily based on tetrahedral silicon and that phosphorus is not chemically incorporated into the silicate network at this point. X-ray diffraction shows the gel to be amorphous at low temperatures. After heat treatment at higher temperatures (i.e. up to 450 °C), P–O–Si linkages are formed and the silicon coordination changes from tetrahedral to octahedral. At the same time, the gel crystallizes. Even after this partial calcination, 31P NMR shows that a large fraction of phytic acid remains in the network. The function of phytic acid as chelating agent is also maintained in the gels dried at 120 °C such that its ability to absorb Ca2+ from aqueous solution is preserved.",
keywords = "Phosphosilicate, Sol-gel, 29Si and 31P NMR, Calcium absorbing",
author = "Dong Qiu and Paul Guerry and Knowles, {Jonathan C.} and Smith, {Mark E.} and Newport, {Robert J.}",
year = "2008",
month = dec,
doi = "10.1007/s10971-008-1818-9",
language = "English",
volume = "48",
pages = "378--383",
journal = "Journal of Sol-Gel Science and Technology",
issn = "1573-4846",
publisher = "Springer Netherlands",
number = "3",

}

RIS

TY - JOUR

T1 - Formation of functional phosphosilicate gels from phytic acid and tetraethyl orthosilicate

AU - Qiu, Dong

AU - Guerry, Paul

AU - Knowles, Jonathan C.

AU - Smith, Mark E.

AU - Newport, Robert J.

PY - 2008/12

Y1 - 2008/12

N2 - Phosphosilicate gels with high phosphorus content (P mol% > Si mol%) have been prepared using phytic acid as the phosphorus precursor, with tetraethyl orthosilicate (TEOS). It is shown that the structure of phytic acid is maintained in both the sols and those gels dried at a low temperature (i.e. ≤120 °C). Solid state 29Si and 31P NMR suggest that the gel network is primarily based on tetrahedral silicon and that phosphorus is not chemically incorporated into the silicate network at this point. X-ray diffraction shows the gel to be amorphous at low temperatures. After heat treatment at higher temperatures (i.e. up to 450 °C), P–O–Si linkages are formed and the silicon coordination changes from tetrahedral to octahedral. At the same time, the gel crystallizes. Even after this partial calcination, 31P NMR shows that a large fraction of phytic acid remains in the network. The function of phytic acid as chelating agent is also maintained in the gels dried at 120 °C such that its ability to absorb Ca2+ from aqueous solution is preserved.

AB - Phosphosilicate gels with high phosphorus content (P mol% > Si mol%) have been prepared using phytic acid as the phosphorus precursor, with tetraethyl orthosilicate (TEOS). It is shown that the structure of phytic acid is maintained in both the sols and those gels dried at a low temperature (i.e. ≤120 °C). Solid state 29Si and 31P NMR suggest that the gel network is primarily based on tetrahedral silicon and that phosphorus is not chemically incorporated into the silicate network at this point. X-ray diffraction shows the gel to be amorphous at low temperatures. After heat treatment at higher temperatures (i.e. up to 450 °C), P–O–Si linkages are formed and the silicon coordination changes from tetrahedral to octahedral. At the same time, the gel crystallizes. Even after this partial calcination, 31P NMR shows that a large fraction of phytic acid remains in the network. The function of phytic acid as chelating agent is also maintained in the gels dried at 120 °C such that its ability to absorb Ca2+ from aqueous solution is preserved.

KW - Phosphosilicate

KW - Sol-gel

KW - 29Si and 31P NMR

KW - Calcium absorbing

U2 - 10.1007/s10971-008-1818-9

DO - 10.1007/s10971-008-1818-9

M3 - Journal article

VL - 48

SP - 378

EP - 383

JO - Journal of Sol-Gel Science and Technology

JF - Journal of Sol-Gel Science and Technology

SN - 1573-4846

IS - 3

ER -