Final published version
Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
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TY - JOUR
T1 - Low temperature plasma-assisted chemical vapour deposition of amorphous carbon films for biomedical-polymeric substrates
AU - McColl, I. R.
AU - Grant, D. M.
AU - Green, S. M.
AU - Wood, J. V.
AU - Parker, T. L.
AU - Parker, K.
AU - Goruppa, A. A.
AU - Braithwaite, N. St J.
PY - 1994/1/1
Y1 - 1994/1/1
N2 - Preliminary results have been obtained on the biocompatibility of amorphous carbon hydrogen (αC:H) coatings deposited on polystyrene. Deposition was carried out at low substrate temperatures using pulsed r.f. plasma-assisted chemical vapour deposition from a methane-hydrogen gas mixture. Cytotoxicity tests using a standard cell line indicate a high degree of biocompatibility. Specifically, αC:H is not toxic to cells, appears to increase cell attachment and affords normal cell growth rates. Wear and other tests have revealed no significant differences between these αC:H coatings and those deposited on a stainless steel at a higher substrate temperature, except for a more pronounced surface texture. However, position in the r.f. plasma was found to be critical for the deposition of good, adherent low temperature coatings.
AB - Preliminary results have been obtained on the biocompatibility of amorphous carbon hydrogen (αC:H) coatings deposited on polystyrene. Deposition was carried out at low substrate temperatures using pulsed r.f. plasma-assisted chemical vapour deposition from a methane-hydrogen gas mixture. Cytotoxicity tests using a standard cell line indicate a high degree of biocompatibility. Specifically, αC:H is not toxic to cells, appears to increase cell attachment and affords normal cell growth rates. Wear and other tests have revealed no significant differences between these αC:H coatings and those deposited on a stainless steel at a higher substrate temperature, except for a more pronounced surface texture. However, position in the r.f. plasma was found to be critical for the deposition of good, adherent low temperature coatings.
U2 - 10.1016/0925-9635(94)90035-3
DO - 10.1016/0925-9635(94)90035-3
M3 - Journal article
AN - SCOPUS:0028117464
VL - 3
SP - 83
EP - 87
JO - Diamond and Related Materials
JF - Diamond and Related Materials
SN - 0925-9635
IS - 1-2
ER -