Final published version
Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
}
TY - JOUR
T1 - Megasonic agitation for enhanced electrodeposition of copper
AU - Kaufmann, Jens Georg
AU - Desmulliez, Marc P. Y.
AU - Tian, Yingtao
AU - Price, Dennis
AU - Hughes, Mike
AU - Strusevich, Nadia
AU - Bailey, Chris
AU - Liu, Changqing
AU - Hutt, David
PY - 2009/8
Y1 - 2009/8
N2 - In this paper we propose an agitation method based on megasonic acoustic streaming to overcome the limitations in plating rate and uniformity of the metal deposits during the electroplating process. Megasonic agitation at a frequency of 1 MHz allows the reduction of the thickness of the Nernst diffusion layer to less than 600 nm. Two applications that demonstrate the benefits of megasonic acoustic streaming are presented: the formation of uniform ultra-fine pitch flip-chip bumps and the metallisation of high aspect ratio microvias. For the latter application, a multi-physics based numerical simulation is implemented to describe the hydrodynamics introduced by the acoustic waves as they travel inside the deep microvias.
AB - In this paper we propose an agitation method based on megasonic acoustic streaming to overcome the limitations in plating rate and uniformity of the metal deposits during the electroplating process. Megasonic agitation at a frequency of 1 MHz allows the reduction of the thickness of the Nernst diffusion layer to less than 600 nm. Two applications that demonstrate the benefits of megasonic acoustic streaming are presented: the formation of uniform ultra-fine pitch flip-chip bumps and the metallisation of high aspect ratio microvias. For the latter application, a multi-physics based numerical simulation is implemented to describe the hydrodynamics introduced by the acoustic waves as they travel inside the deep microvias.
KW - Trench
KW - Print Circuit Board
KW - Seed Layer
KW - Acoustic Streaming
KW - Copper Electrodeposition
U2 - 10.1007/s00542-009-0886-2
DO - 10.1007/s00542-009-0886-2
M3 - Journal article
VL - 15
SP - 1245
EP - 1254
JO - Microsystem Technologies
JF - Microsystem Technologies
SN - 0946-7076
IS - 8
ER -