Home > Research > Publications & Outputs > Self-Organized Wrinkling in Thin Polymer Films ...

Links

Text available via DOI:

View graph of relations

Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions: Patterning Strategy for Microfluidic Applications

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Published

Standard

Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions: Patterning Strategy for Microfluidic Applications. / Singh, Naval; Verma, Ankur; Sachan, Priyanka et al.
In: ACS Applied Polymer Materials, Vol. 3, No. 12, 10.12.2021, p. 6198-6206.

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Harvard

Singh, N, Verma, A, Sachan, P, Sharma, A & Kulkarni, MM 2021, 'Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions: Patterning Strategy for Microfluidic Applications', ACS Applied Polymer Materials, vol. 3, no. 12, pp. 6198-6206. https://doi.org/10.1021/acsapm.1c01044

APA

Vancouver

Singh N, Verma A, Sachan P, Sharma A, Kulkarni MM. Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions: Patterning Strategy for Microfluidic Applications. ACS Applied Polymer Materials. 2021 Dec 10;3(12):6198-6206. Epub 2021 Nov 15. doi: 10.1021/acsapm.1c01044

Author

Singh, Naval ; Verma, Ankur ; Sachan, Priyanka et al. / Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions : Patterning Strategy for Microfluidic Applications. In: ACS Applied Polymer Materials. 2021 ; Vol. 3, No. 12. pp. 6198-6206.

Bibtex

@article{4c448448b1e6458cb908c2c293f99bf9,
title = "Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions: Patterning Strategy for Microfluidic Applications",
abstract = "Self-organized wrinkling instabilities in thin polymer films have instigated a field of versatile surface patterning and have spurred several research efforts in developing micro- and nanopatterned templates for a wide range of applications. Here, we report for the first time a distinct class of wrinkles in a thin polymer (polystyrene, PS) film coated on a substrate under a mixture of organic solvent and aqueous nonsolvent. The solvent (dimethyl formamide, DMF) softens and swells the polymer and paves the way for wetting of the hydrophilic substrate (≥46 mJ/m2) by the solvent–nonsolvent (S-NS) mixture, leading to wrinkle formation. It is investigated that selective delamination-induced wrinkling is a generic phenomenon and takes place in various polymers as well as different combinations of solvent–nonsolvent mixtures. The surface energy of the substrate and the composition of the solvent–nonsolvent mixture play a critical role as wrinkling is not observed on substrates with lower surface energy (<46 mJ/m2). An isotropically distributed yet disordered self-organized wrinkle network of hollow buried channels is formed, and it is illustrated that these can be exploited to generate a mesh of microwires and harnessed to form highly directional patterns using electron beam lithography, which can turn the new leaf for nano- and microfluidic device fabrication platforms.",
author = "Naval Singh and Ankur Verma and Priyanka Sachan and Ashutosh Sharma and Kulkarni, {Manish M.}",
year = "2021",
month = dec,
day = "10",
doi = "10.1021/acsapm.1c01044",
language = "English",
volume = "3",
pages = "6198--6206",
journal = "ACS Applied Polymer Materials",
issn = "2637-6105",
publisher = "American Chemical Society",
number = "12",

}

RIS

TY - JOUR

T1 - Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions

T2 - Patterning Strategy for Microfluidic Applications

AU - Singh, Naval

AU - Verma, Ankur

AU - Sachan, Priyanka

AU - Sharma, Ashutosh

AU - Kulkarni, Manish M.

PY - 2021/12/10

Y1 - 2021/12/10

N2 - Self-organized wrinkling instabilities in thin polymer films have instigated a field of versatile surface patterning and have spurred several research efforts in developing micro- and nanopatterned templates for a wide range of applications. Here, we report for the first time a distinct class of wrinkles in a thin polymer (polystyrene, PS) film coated on a substrate under a mixture of organic solvent and aqueous nonsolvent. The solvent (dimethyl formamide, DMF) softens and swells the polymer and paves the way for wetting of the hydrophilic substrate (≥46 mJ/m2) by the solvent–nonsolvent (S-NS) mixture, leading to wrinkle formation. It is investigated that selective delamination-induced wrinkling is a generic phenomenon and takes place in various polymers as well as different combinations of solvent–nonsolvent mixtures. The surface energy of the substrate and the composition of the solvent–nonsolvent mixture play a critical role as wrinkling is not observed on substrates with lower surface energy (<46 mJ/m2). An isotropically distributed yet disordered self-organized wrinkle network of hollow buried channels is formed, and it is illustrated that these can be exploited to generate a mesh of microwires and harnessed to form highly directional patterns using electron beam lithography, which can turn the new leaf for nano- and microfluidic device fabrication platforms.

AB - Self-organized wrinkling instabilities in thin polymer films have instigated a field of versatile surface patterning and have spurred several research efforts in developing micro- and nanopatterned templates for a wide range of applications. Here, we report for the first time a distinct class of wrinkles in a thin polymer (polystyrene, PS) film coated on a substrate under a mixture of organic solvent and aqueous nonsolvent. The solvent (dimethyl formamide, DMF) softens and swells the polymer and paves the way for wetting of the hydrophilic substrate (≥46 mJ/m2) by the solvent–nonsolvent (S-NS) mixture, leading to wrinkle formation. It is investigated that selective delamination-induced wrinkling is a generic phenomenon and takes place in various polymers as well as different combinations of solvent–nonsolvent mixtures. The surface energy of the substrate and the composition of the solvent–nonsolvent mixture play a critical role as wrinkling is not observed on substrates with lower surface energy (<46 mJ/m2). An isotropically distributed yet disordered self-organized wrinkle network of hollow buried channels is formed, and it is illustrated that these can be exploited to generate a mesh of microwires and harnessed to form highly directional patterns using electron beam lithography, which can turn the new leaf for nano- and microfluidic device fabrication platforms.

U2 - 10.1021/acsapm.1c01044

DO - 10.1021/acsapm.1c01044

M3 - Journal article

VL - 3

SP - 6198

EP - 6206

JO - ACS Applied Polymer Materials

JF - ACS Applied Polymer Materials

SN - 2637-6105

IS - 12

ER -