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Stress-induced curvature of focused ion beam fabricated microcantilevers

Research output: Contribution to Journal/Magazine › Journal article › peer-review

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Stress-induced curvature of focused ion beam fabricated microcantilevers. / Prewett, P. D.; Anthony, C. J.; Cheneler, D. et al.

In: Micro and Nano Letters, Vol. 3, No. 1, 08.04.2008, p. 25-28.

Research output: Contribution to Journal/Magazine › Journal article › peer-review

Harvard

Prewett, PD, Anthony, CJ, Cheneler, D & Ward, MCL 2008, 'Stress-induced curvature of focused ion beam fabricated microcantilevers', Micro and Nano Letters, vol. 3, no. 1, pp. 25-28. https://doi.org/10.1049/mnl:20070072

APA

Prewett, P. D., Anthony, C. J., Cheneler, D., & Ward, M. C. L. (2008). Stress-induced curvature of focused ion beam fabricated microcantilevers. Micro and Nano Letters, 3(1), 25-28. https://doi.org/10.1049/mnl:20070072

Vancouver

Prewett PD, Anthony CJ, Cheneler D, Ward MCL. Stress-induced curvature of focused ion beam fabricated microcantilevers. Micro and Nano Letters. 2008 Apr 8;3(1):25-28. doi: 10.1049/mnl:20070072

Author

Prewett, P. D. ; Anthony, C. J. ; Cheneler, D. et al. / Stress-induced curvature of focused ion beam fabricated microcantilevers. In: Micro and Nano Letters. 2008 ; Vol. 3, No. 1. pp. 25-28.

Bibtex

@article{c2433463bf2f486ab769909f810916c0,
title = "Stress-induced curvature of focused ion beam fabricated microcantilevers",
abstract = "Microcantilevers with very low spring constants, as required to measure the short-range Casimir force, can be fabricated by focused ion beam thinning of conventional atomic force microscope cantilevers, but the resulting beams have a stress-induced curvature. This can be explained by consideration of the implanted gallium ions and associated damage effects in the etched surface. The problem can be overcome by using a complementary etch method in which top and bottom surfaces of the microcantilever are etched by the same amount.",
author = "Prewett, {P. D.} and Anthony, {C. J.} and D. Cheneler and Ward, {M. C. L.}",
year = "2008",
month = apr,
day = "8",
doi = "10.1049/mnl:20070072",
language = "English",
volume = "3",
pages = "25--28",
journal = "Micro and Nano Letters",
issn = "1750-0443",
publisher = "Institution of Engineering and Technology",
number = "1",

}

RIS

TY - JOUR

T1 - Stress-induced curvature of focused ion beam fabricated microcantilevers

AU - Prewett, P. D.

AU - Anthony, C. J.

AU - Cheneler, D.

AU - Ward, M. C. L.

PY - 2008/4/8

Y1 - 2008/4/8

N2 - Microcantilevers with very low spring constants, as required to measure the short-range Casimir force, can be fabricated by focused ion beam thinning of conventional atomic force microscope cantilevers, but the resulting beams have a stress-induced curvature. This can be explained by consideration of the implanted gallium ions and associated damage effects in the etched surface. The problem can be overcome by using a complementary etch method in which top and bottom surfaces of the microcantilever are etched by the same amount.

AB - Microcantilevers with very low spring constants, as required to measure the short-range Casimir force, can be fabricated by focused ion beam thinning of conventional atomic force microscope cantilevers, but the resulting beams have a stress-induced curvature. This can be explained by consideration of the implanted gallium ions and associated damage effects in the etched surface. The problem can be overcome by using a complementary etch method in which top and bottom surfaces of the microcantilever are etched by the same amount.

U2 - 10.1049/mnl:20070072

DO - 10.1049/mnl:20070072

M3 - Journal article

VL - 3

SP - 25

EP - 28

JO - Micro and Nano Letters

JF - Micro and Nano Letters

SN - 1750-0443

IS - 1

ER -