Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
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TY - JOUR
T1 - The electrochemical reactivity of amorphous hydrogenated carbon nitrides for varying nitrogen contents: the role of the substrate
AU - Adamopoulos, George
PY - 2003
Y1 - 2003
N2 - A series of hydrogenated carbon nitride films have been deposited on titanium and n-type highly doped (1 0 0) silicon substrates by the integrated distributed electron cyclotron resonance reactor from acetylene and nitrogen gas mixtures. It has been found that for nitrogen content between 5 and 25% the electrical conductivity and the electrochemical reactivity, for an outer sphere reaction such as that due to the ferri-ferrocyanide system, varies in opposite directions. In addition the overall kinetic behaviour of the same system, looking similar to that of a simple electron transfer with a partial mass transfer in solution, contains another contribution. This can be explained by the presence of a more resistive layer within the carbon film and close to the solution, where electronic transport would occur by hopping between a large number of localised states. Finally, in contrast to the silicon substrate which introduces a resistive layer resulting in an additional potential drop, titanium seems to be a more promising substrate because of the negligibility of the latter effect.
AB - A series of hydrogenated carbon nitride films have been deposited on titanium and n-type highly doped (1 0 0) silicon substrates by the integrated distributed electron cyclotron resonance reactor from acetylene and nitrogen gas mixtures. It has been found that for nitrogen content between 5 and 25% the electrical conductivity and the electrochemical reactivity, for an outer sphere reaction such as that due to the ferri-ferrocyanide system, varies in opposite directions. In addition the overall kinetic behaviour of the same system, looking similar to that of a simple electron transfer with a partial mass transfer in solution, contains another contribution. This can be explained by the presence of a more resistive layer within the carbon film and close to the solution, where electronic transport would occur by hopping between a large number of localised states. Finally, in contrast to the silicon substrate which introduces a resistive layer resulting in an additional potential drop, titanium seems to be a more promising substrate because of the negligibility of the latter effect.
KW - carbon nitride films
KW - electrochemical properties
KW - ECR deposition
U2 - 10.1016/S0925-9635(03)00038-4
DO - 10.1016/S0925-9635(03)00038-4
M3 - Journal article
VL - 12
SP - 613
EP - 617
JO - Diamond and Related Materials
JF - Diamond and Related Materials
SN - 0925-9635
IS - 3-7
ER -