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Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness.

Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSN › Chapter

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Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness. / Dewar, Richard; Joyce, Malcolm J.
Proceedings of Electrochem 2004. 2004.

Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSN › Chapter

Harvard

Dewar, R & Joyce, MJ 2004, Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness. in Proceedings of Electrochem 2004.

APA

Dewar, R., & Joyce, M. J. (2004). Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness. In Proceedings of Electrochem 2004

Vancouver

Dewar R, Joyce MJ. Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness. In Proceedings of Electrochem 2004. 2004

Author

Dewar, Richard ; Joyce, Malcolm J. / Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness. Proceedings of Electrochem 2004. 2004.

Bibtex

@inbook{818a8d9ed5ff44398f6440abc25e5e3f,
title = "Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness.",
author = "Richard Dewar and Joyce, {Malcolm J.}",
year = "2004",
language = "English",
booktitle = "Proceedings of Electrochem 2004",

}

RIS

TY - CHAP

T1 - Use of QCM in fluid applications: performance deterioration with cleaning and choice of surface roughness.

AU - Dewar, Richard

AU - Joyce, Malcolm J.

PY - 2004

Y1 - 2004

M3 - Chapter

BT - Proceedings of Electrochem 2004

ER -