Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
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TY - JOUR
T1 - Characteristic jump in the electrical properties of a Pd/AlN/Si-based device on exposure to hydrogen.
AU - Thakur, J. S.
AU - Prakasam, H. E.
AU - Zhang, Linfeng
AU - McCullen, E. F.
AU - Rimai, L.
AU - García-Suárez, Victor M.
AU - Naik, R.
AU - Ng, K. Y. S.
AU - Auner, G. W.
PY - 2007/2/6
Y1 - 2007/2/6
N2 - The time-dependant current response of Pd/AlN/Si-based devices is investigated for different hydrogen concentrations. At a fixed applied voltage, the device current suddenly increases when hydrogen gas is turned on and the magnitude of this current shift varies with the hydrogen concentrations. Using first-principles simulations, the electronic structure of the Pd with different hydrogen concentrations in tetrahedric and octahedric positions is calculated. We find that when hydrogen loads the Pd metal, its Fermi energy changes, which affects the Fermi level of the Pd/AlN/Si device and thus its electrical response.
AB - The time-dependant current response of Pd/AlN/Si-based devices is investigated for different hydrogen concentrations. At a fixed applied voltage, the device current suddenly increases when hydrogen gas is turned on and the magnitude of this current shift varies with the hydrogen concentrations. Using first-principles simulations, the electronic structure of the Pd with different hydrogen concentrations in tetrahedric and octahedric positions is calculated. We find that when hydrogen loads the Pd metal, its Fermi energy changes, which affects the Fermi level of the Pd/AlN/Si device and thus its electrical response.
U2 - 10.1103/PhysRevB.75.075308
DO - 10.1103/PhysRevB.75.075308
M3 - Journal article
VL - 75
SP - 75308
JO - Physical review B
JF - Physical review B
SN - 1550-235X
ER -