Rights statement: ©2013 American Physical Society
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Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
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TY - JOUR
T1 - Coherent quantum oscillations and echo measurements of a Si charge qubit
AU - Shi, Zhan
AU - Simmons, C. B.
AU - Ward, Daniel R.
AU - Prance, Jonathan
AU - Mohr, R. T.
AU - Koh, Teck Seng
AU - Gamble, John King
AU - Wu, Xian
AU - Savage, D. E.
AU - Lagally, M. G.
AU - Friesen, Mark
AU - Coppersmith, S. N.
AU - Eriksson, M. A.
N1 - ©2013 American Physical Society
PY - 2013/8/13
Y1 - 2013/8/13
N2 - Fast quantum oscillations of a charge qubit in a double quantum dot fabricated in a Si/SiGe heterostructure are demonstrated and characterized experimentally. The measured inhomogeneous dephasing time T2* ranges from 127 ps to 2.1 ns; it depends substantially on how the energy difference of the two qubit states varies with external voltages, consistent with a decoherence process that is dominated by detuning noise (charge noise that changes the asymmetry of the qubit's double-well potential). In the regime with the shortest T2*, applying a charge-echo pulse sequence increases the measured inhomogeneous decoherence time from 127 to 760 ps, demonstrating that low-frequency noise processes are an important dephasing mechanism.
AB - Fast quantum oscillations of a charge qubit in a double quantum dot fabricated in a Si/SiGe heterostructure are demonstrated and characterized experimentally. The measured inhomogeneous dephasing time T2* ranges from 127 ps to 2.1 ns; it depends substantially on how the energy difference of the two qubit states varies with external voltages, consistent with a decoherence process that is dominated by detuning noise (charge noise that changes the asymmetry of the qubit's double-well potential). In the regime with the shortest T2*, applying a charge-echo pulse sequence increases the measured inhomogeneous decoherence time from 127 to 760 ps, demonstrating that low-frequency noise processes are an important dephasing mechanism.
U2 - 10.1103/PhysRevB.88.075416
DO - 10.1103/PhysRevB.88.075416
M3 - Journal article
VL - 88
JO - Physical review B
JF - Physical review B
SN - 1098-0121
IS - 7
M1 - 075416
ER -