Final published version
Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
}
TY - JOUR
T1 - Dewetting of Au nanoparticle assemblies
AU - Alhummiany, Haya
AU - Jarvis, Samuel
AU - Woolley, Richard A. J.
AU - Stannard, Andrew
AU - Blunt, Matthew
AU - Moriarty, Philip
PY - 2011/9/28
Y1 - 2011/9/28
N2 - Atomic force microscopy measurements as a function of annealing temperature, time of exposure to a high relative humidity environment, and scan duration/parameters have been used to ascertain the stability of assemblies of thiol-passivated Au nanoparticles on silicon substrates. Striking changes in the morphology of self-organised nanoparticle patterns are observed following the exposure of samples to atmospheres with a relative humidity of 80%. The nanoparticle film dewets the underlying silicon substrate on exposure to water, forming locally thicker regions. Time-lapse imaging shows that the dewetting proceeds via layer-by-layer growth, and there is no evidence for classical coarsening mechanisms involving self-similar film morphologies. Annealing at temperatures between 100 degrees C and 160 degrees C produces a rather different dewetting effect for the highest temperatures and/or annealing times, where significant nanoparticle sintering promotes the break-up of the two-dimensional assembly. The morphology of the initial 2D film plays a key role in determining the time scale on which annealing promotes nanoparticle dewetting. Dewetting can also be induced by a scanning probe such that localised (micron-scale) areas of the nanoparticle assembly can be converted from 2D to 3D character.
AB - Atomic force microscopy measurements as a function of annealing temperature, time of exposure to a high relative humidity environment, and scan duration/parameters have been used to ascertain the stability of assemblies of thiol-passivated Au nanoparticles on silicon substrates. Striking changes in the morphology of self-organised nanoparticle patterns are observed following the exposure of samples to atmospheres with a relative humidity of 80%. The nanoparticle film dewets the underlying silicon substrate on exposure to water, forming locally thicker regions. Time-lapse imaging shows that the dewetting proceeds via layer-by-layer growth, and there is no evidence for classical coarsening mechanisms involving self-similar film morphologies. Annealing at temperatures between 100 degrees C and 160 degrees C produces a rather different dewetting effect for the highest temperatures and/or annealing times, where significant nanoparticle sintering promotes the break-up of the two-dimensional assembly. The morphology of the initial 2D film plays a key role in determining the time scale on which annealing promotes nanoparticle dewetting. Dewetting can also be induced by a scanning probe such that localised (micron-scale) areas of the nanoparticle assembly can be converted from 2D to 3D character.
KW - dots,films,gold,nanocrystal superlattices,networks,rings,transport
U2 - 10.1039/c1jm12182k
DO - 10.1039/c1jm12182k
M3 - Journal article
VL - 21
SP - 16983
EP - 16989
JO - Journal of Materials Chemistry
JF - Journal of Materials Chemistry
SN - 0959-9428
IS - 42
ER -