Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSN › Conference contribution/Paper › peer-review
Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSN › Conference contribution/Paper › peer-review
}
TY - GEN
T1 - Early stages of growth and nanostructure of Pb(Zr,Ti)O-3 thin films observed by atomic force microscopy
AU - Craciun, F.
AU - Verardi, P.
AU - Dinescu, M.
AU - Dinelli, F.
AU - Kolosov, Oleg
PY - 1999
Y1 - 1999
N2 - We prepared lead zirconate-titanate (PZT) layers with different thicknesses on Au coated Si(100) and Si(lll) wafers by pulsed laser deposition, using the same set of experimental conditions: a Nd-YAG laser, 1064 nm, 10 ns, 10 Hz, substrate temperature 370 degrees C, oxygen pressure 150 mTorr, laser fluence 25 J/cm(2), by varying the number of laser pulses. Different analysis put in evidence the crystallographic structure and chemical composition of films. Surface morphology was examined by atomic force microscopy (AFM). Analysis of films with very few atomic layers suggests that the growth proceeds by Volmer-Weber island-growth mechanism. Different geometrical, chemical and kinetic factors responsible for this type of growth are discussed. Comparative AFM analyses of surface roughness performed on films with different thickness allow for the study of the interface width evolution during the growth and to predict the conditions for obtaining films with a smooth surface. (C) 1998 Elsevier Science S.A. All rights reserved.
AB - We prepared lead zirconate-titanate (PZT) layers with different thicknesses on Au coated Si(100) and Si(lll) wafers by pulsed laser deposition, using the same set of experimental conditions: a Nd-YAG laser, 1064 nm, 10 ns, 10 Hz, substrate temperature 370 degrees C, oxygen pressure 150 mTorr, laser fluence 25 J/cm(2), by varying the number of laser pulses. Different analysis put in evidence the crystallographic structure and chemical composition of films. Surface morphology was examined by atomic force microscopy (AFM). Analysis of films with very few atomic layers suggests that the growth proceeds by Volmer-Weber island-growth mechanism. Different geometrical, chemical and kinetic factors responsible for this type of growth are discussed. Comparative AFM analyses of surface roughness performed on films with different thickness allow for the study of the interface width evolution during the growth and to predict the conditions for obtaining films with a smooth surface. (C) 1998 Elsevier Science S.A. All rights reserved.
M3 - Conference contribution/Paper
SN - 0-08-043606-4
SP - 281
EP - 285
BT - Thin films epitaxial growth and nanostructures : proceedings of the EMRS Spring Conference, Strasbourg, France, June 16-19, 1998 /
A2 - Kasper, Erich
A2 - Wang, Kang L.
A2 - Hasegawa, H.
PB - Elsevier
CY - Amsterdam
T2 - Symposium on Thin Films Epitaxial Growth and Nanostructures, at the E-MRS Spring Meeting 1998
Y2 - 16 June 1998 through 19 June 1998
ER -