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Efficient light emission from MoS2 flakes by in-solution superacid treatment

Research output: Contribution to conference - Without ISBN/ISSN Abstract

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Efficient light emission from MoS2 flakes by in-solution superacid treatment. / Fong, James.

2018. Abstract from nanoGe Fall Meeting , Torremolinos, Spain.

Research output: Contribution to conference - Without ISBN/ISSN Abstract

Harvard

Fong, J 2018, 'Efficient light emission from MoS2 flakes by in-solution superacid treatment', nanoGe Fall Meeting , Torremolinos, Spain, 22/10/18 - 26/10/18.

APA

Fong, J. (2018). Efficient light emission from MoS2 flakes by in-solution superacid treatment. Abstract from nanoGe Fall Meeting , Torremolinos, Spain.

Vancouver

Fong J. Efficient light emission from MoS2 flakes by in-solution superacid treatment. 2018. Abstract from nanoGe Fall Meeting , Torremolinos, Spain.

Author

Fong, James. / Efficient light emission from MoS2 flakes by in-solution superacid treatment. Abstract from nanoGe Fall Meeting , Torremolinos, Spain.

Bibtex

@conference{8c756fdb87b142e9bf4381298c1d5835,
title = "Efficient light emission from MoS2 flakes by in-solution superacid treatment",
abstract = "Two-dimensional (2D) molybdenum disulphide (MoS2) attracts wide usage in opto electronic/photovoltaic devices due to its direct bandgap of 1.90 eV [1]. Among different monolayer preparation methods, liquid assisted exfoliation is preferred, as it is simple, scalable, convenient and cost-effective than other conventional methods (mechanical exfoliation and chemical vapour deposition etc) [2]. In this work, ultrasonic bath sonication of bulk MoS2 (6-40 µm powder) in iso-propanol/water mixture (70/30 vol %) is followed according to [3]. Full width half-intensity (FWHI) value of 200 meV (from the photoluminescence (PL) emission peak) showed that the exfoliated MoS2 contains 2-3 layers (in agreement with our atomic force microscopy (AFM) results) [4]. Super acid treatment (drop casting) onto MoS2/Si wafer improved the PL by three orders of magnitude. In addition and all-wet treatment process was developed - with the maximum PL enhancement observed to be around 200 times. The result shows that all-wet processing can enable efficient light generation from few layer MoS2, which is promising for applications using 2D inks for optoelectronics.",
author = "James Fong",
year = "2018",
month = oct,
day = "26",
language = "English",
note = "nanoGe Fall Meeting ; Conference date: 22-10-2018 Through 26-10-2018",
url = "https://www.nanoge.org/FallMeeting18/home",

}

RIS

TY - CONF

T1 - Efficient light emission from MoS2 flakes by in-solution superacid treatment

AU - Fong, James

PY - 2018/10/26

Y1 - 2018/10/26

N2 - Two-dimensional (2D) molybdenum disulphide (MoS2) attracts wide usage in opto electronic/photovoltaic devices due to its direct bandgap of 1.90 eV [1]. Among different monolayer preparation methods, liquid assisted exfoliation is preferred, as it is simple, scalable, convenient and cost-effective than other conventional methods (mechanical exfoliation and chemical vapour deposition etc) [2]. In this work, ultrasonic bath sonication of bulk MoS2 (6-40 µm powder) in iso-propanol/water mixture (70/30 vol %) is followed according to [3]. Full width half-intensity (FWHI) value of 200 meV (from the photoluminescence (PL) emission peak) showed that the exfoliated MoS2 contains 2-3 layers (in agreement with our atomic force microscopy (AFM) results) [4]. Super acid treatment (drop casting) onto MoS2/Si wafer improved the PL by three orders of magnitude. In addition and all-wet treatment process was developed - with the maximum PL enhancement observed to be around 200 times. The result shows that all-wet processing can enable efficient light generation from few layer MoS2, which is promising for applications using 2D inks for optoelectronics.

AB - Two-dimensional (2D) molybdenum disulphide (MoS2) attracts wide usage in opto electronic/photovoltaic devices due to its direct bandgap of 1.90 eV [1]. Among different monolayer preparation methods, liquid assisted exfoliation is preferred, as it is simple, scalable, convenient and cost-effective than other conventional methods (mechanical exfoliation and chemical vapour deposition etc) [2]. In this work, ultrasonic bath sonication of bulk MoS2 (6-40 µm powder) in iso-propanol/water mixture (70/30 vol %) is followed according to [3]. Full width half-intensity (FWHI) value of 200 meV (from the photoluminescence (PL) emission peak) showed that the exfoliated MoS2 contains 2-3 layers (in agreement with our atomic force microscopy (AFM) results) [4]. Super acid treatment (drop casting) onto MoS2/Si wafer improved the PL by three orders of magnitude. In addition and all-wet treatment process was developed - with the maximum PL enhancement observed to be around 200 times. The result shows that all-wet processing can enable efficient light generation from few layer MoS2, which is promising for applications using 2D inks for optoelectronics.

M3 - Abstract

T2 - nanoGe Fall Meeting

Y2 - 22 October 2018 through 26 October 2018

ER -