Final published version
Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
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TY - JOUR
T1 - Micromachining of ridge optical waveguides on top of He+ -implanted Β-BaB2O4 crystals by femtosecond laser ablation
AU - Degl'Innocenti, R.
AU - Reidt, S.
AU - Guarino, A.
AU - Rezzonico, D.
AU - Poberaj, G.
AU - Günter, P.
PY - 2006
Y1 - 2006
N2 - We report on a technique for the fabrication of ridge optical waveguides on top of Β- BaB2 O4 (BBO) crystals. The BBO crystals were first implanted by He+ ions to form planar optical waveguides. In the second step, the femtosecond laser ablation technique was employed for micromachining of ridge-type optical waveguides. A thorough study of material-specific ablation parameters for BBO has been performed in order to achieve ablated structures with smooth sidewalls. A further process of Ar+ ion smoothing in a plasma chamber was used to reduce the sidewall roughness of the ablated ridges from 75 to 35 nm root mean square. We demonstrated optical waveguiding in these femtosecond-ablated plasma-treated waveguides and measured total propagation losses of less than 10 dBcm at 532 nm, making them suitable for nonlinear- and electro-optical applications.
AB - We report on a technique for the fabrication of ridge optical waveguides on top of Β- BaB2 O4 (BBO) crystals. The BBO crystals were first implanted by He+ ions to form planar optical waveguides. In the second step, the femtosecond laser ablation technique was employed for micromachining of ridge-type optical waveguides. A thorough study of material-specific ablation parameters for BBO has been performed in order to achieve ablated structures with smooth sidewalls. A further process of Ar+ ion smoothing in a plasma chamber was used to reduce the sidewall roughness of the ablated ridges from 75 to 35 nm root mean square. We demonstrated optical waveguiding in these femtosecond-ablated plasma-treated waveguides and measured total propagation losses of less than 10 dBcm at 532 nm, making them suitable for nonlinear- and electro-optical applications.
U2 - 10.1063/1.2396716
DO - 10.1063/1.2396716
M3 - Journal article
AN - SCOPUS:33845810132
VL - 100
JO - Journal of Applied Physics
JF - Journal of Applied Physics
SN - 0021-8979
IS - 11
M1 - 113121
ER -