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Progress in near-field photothermal infra-red microspectroscopy.

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Progress in near-field photothermal infra-red microspectroscopy. / Hammiche, A.; Bozec, L.; Pollock, Hubert M. et al.
In: Journal of Microscopy, Vol. 213, No. 2, 02.2004, p. 129-134.

Research output: Contribution to Journal/Magazine › Journal article › peer-review

Harvard

Hammiche, A, Bozec, L, Pollock, HM, German, M & Reading, M 2004, 'Progress in near-field photothermal infra-red microspectroscopy.', Journal of Microscopy, vol. 213, no. 2, pp. 129-134. https://doi.org/10.1111/j.1365-2818.2004.01292.x

APA

Hammiche, A., Bozec, L., Pollock, H. M., German, M., & Reading, M. (2004). Progress in near-field photothermal infra-red microspectroscopy. Journal of Microscopy, 213(2), 129-134. https://doi.org/10.1111/j.1365-2818.2004.01292.x

Vancouver

Hammiche A, Bozec L, Pollock HM, German M, Reading M. Progress in near-field photothermal infra-red microspectroscopy. Journal of Microscopy. 2004 Feb;213(2):129-134. doi: 10.1111/j.1365-2818.2004.01292.x

Author

Hammiche, A. ; Bozec, L. ; Pollock, Hubert M. et al. / Progress in near-field photothermal infra-red microspectroscopy. In: Journal of Microscopy. 2004 ; Vol. 213, No. 2. pp. 129-134.

Bibtex

@article{fc4c747149bd480ca310826c290946e2,
title = "Progress in near-field photothermal infra-red microspectroscopy.",
abstract = "Near-field photothermal Fourier transform infra-red microspectroscopy, which utilizes atomic force microscopy (AFM)-type temperature sensors, is being developed with the aim of achieving a spatial resolution higher than the diffraction limit. Here we report on a new implementation of the technique. Sensitivity of the technique is assessed by recording infra-red spectra from small quantities of analytes and thin films. A photothermomechanical approach, which utilizes conventional AFM probes as temperature sensors, is also discussed based on preliminary results. Early indication suggests that the photothermal approach is more sensitive than the thermomechanical one.",
keywords = "AFM • diffraction limit • FTIR spectroscopy",
author = "A. Hammiche and L. Bozec and Pollock, {Hubert M.} and M. German and M. Reading",
year = "2004",
month = feb,
doi = "10.1111/j.1365-2818.2004.01292.x",
language = "English",
volume = "213",
pages = "129--134",
journal = "Journal of Microscopy",
issn = "0022-2720",
publisher = "Wiley-Blackwell",
number = "2",

}

RIS

TY - JOUR

T1 - Progress in near-field photothermal infra-red microspectroscopy.

AU - Hammiche, A.

AU - Bozec, L.

AU - Pollock, Hubert M.

AU - German, M.

AU - Reading, M.

PY - 2004/2

Y1 - 2004/2

N2 - Near-field photothermal Fourier transform infra-red microspectroscopy, which utilizes atomic force microscopy (AFM)-type temperature sensors, is being developed with the aim of achieving a spatial resolution higher than the diffraction limit. Here we report on a new implementation of the technique. Sensitivity of the technique is assessed by recording infra-red spectra from small quantities of analytes and thin films. A photothermomechanical approach, which utilizes conventional AFM probes as temperature sensors, is also discussed based on preliminary results. Early indication suggests that the photothermal approach is more sensitive than the thermomechanical one.

AB - Near-field photothermal Fourier transform infra-red microspectroscopy, which utilizes atomic force microscopy (AFM)-type temperature sensors, is being developed with the aim of achieving a spatial resolution higher than the diffraction limit. Here we report on a new implementation of the technique. Sensitivity of the technique is assessed by recording infra-red spectra from small quantities of analytes and thin films. A photothermomechanical approach, which utilizes conventional AFM probes as temperature sensors, is also discussed based on preliminary results. Early indication suggests that the photothermal approach is more sensitive than the thermomechanical one.

KW - AFM • diffraction limit • FTIR spectroscopy

U2 - 10.1111/j.1365-2818.2004.01292.x

DO - 10.1111/j.1365-2818.2004.01292.x

M3 - Journal article

VL - 213

SP - 129

EP - 134

JO - Journal of Microscopy

JF - Journal of Microscopy

SN - 0022-2720

IS - 2

ER -