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Rapid slider LPE growth of InAs quantum wells

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Rapid slider LPE growth of InAs quantum wells. / Krier, A ; Labadi, Z ; Richardson, J .
In: IEE Proceedings - Optoelectronics, Vol. 145, No. 5, 10.1998, p. 297-301.

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Harvard

Krier, A, Labadi, Z & Richardson, J 1998, 'Rapid slider LPE growth of InAs quantum wells', IEE Proceedings - Optoelectronics, vol. 145, no. 5, pp. 297-301. https://doi.org/10.1049/ip-opt:19982309

APA

Krier, A., Labadi, Z., & Richardson, J. (1998). Rapid slider LPE growth of InAs quantum wells. IEE Proceedings - Optoelectronics, 145(5), 297-301. https://doi.org/10.1049/ip-opt:19982309

Vancouver

Krier A, Labadi Z, Richardson J. Rapid slider LPE growth of InAs quantum wells. IEE Proceedings - Optoelectronics. 1998 Oct;145(5):297-301. doi: 10.1049/ip-opt:19982309

Author

Krier, A ; Labadi, Z ; Richardson, J . / Rapid slider LPE growth of InAs quantum wells. In: IEE Proceedings - Optoelectronics. 1998 ; Vol. 145, No. 5. pp. 297-301.

Bibtex

@article{f09dd866799d47ccb60bf8930a5529fc,
title = "Rapid slider LPE growth of InAs quantum wells",
abstract = "The authors report the successful growth of InAs quantum wells from the liquid phase using liquid phase epitaxy (LPE). They demonstrate the capacity of a modified rapid slider LPE technique for the growth of InAs layers in the thickness range below the electron de Broglie wavelength. InAs quantum wells 2.5nm in thickness have been grown with excellent interface quality and thickness uniformity comparable to molecular beam or vapour phase techniques such as MBE or MOVPE. InAs quantum wells were grown closely lattice-matched to InAsSbP quaternary alloy confining layers having a much wider energy bandgap (0.5eV). These quantum wells embedded between proper lattice-matched confining layers with a wider bandgap form the key element of a promising structure for the fabrication of mid-infrared LEDs and lasers based on InAs quantum wells. Some basic characteristics of the kinetics of InAs heteroepitaxy on InAsSbP quaternary surfaces are reported and the extent to which the main experimental parameters control the resulting layer thickness is determined.",
author = "A Krier and Z Labadi and J Richardson",
year = "1998",
month = oct,
doi = "10.1049/ip-opt:19982309",
language = "English",
volume = "145",
pages = "297--301",
journal = "IEE Proceedings - Optoelectronics",
issn = "1350-2433",
publisher = "Institute of Electrical Engineers",
number = "5",

}

RIS

TY - JOUR

T1 - Rapid slider LPE growth of InAs quantum wells

AU - Krier, A

AU - Labadi, Z

AU - Richardson, J

PY - 1998/10

Y1 - 1998/10

N2 - The authors report the successful growth of InAs quantum wells from the liquid phase using liquid phase epitaxy (LPE). They demonstrate the capacity of a modified rapid slider LPE technique for the growth of InAs layers in the thickness range below the electron de Broglie wavelength. InAs quantum wells 2.5nm in thickness have been grown with excellent interface quality and thickness uniformity comparable to molecular beam or vapour phase techniques such as MBE or MOVPE. InAs quantum wells were grown closely lattice-matched to InAsSbP quaternary alloy confining layers having a much wider energy bandgap (0.5eV). These quantum wells embedded between proper lattice-matched confining layers with a wider bandgap form the key element of a promising structure for the fabrication of mid-infrared LEDs and lasers based on InAs quantum wells. Some basic characteristics of the kinetics of InAs heteroepitaxy on InAsSbP quaternary surfaces are reported and the extent to which the main experimental parameters control the resulting layer thickness is determined.

AB - The authors report the successful growth of InAs quantum wells from the liquid phase using liquid phase epitaxy (LPE). They demonstrate the capacity of a modified rapid slider LPE technique for the growth of InAs layers in the thickness range below the electron de Broglie wavelength. InAs quantum wells 2.5nm in thickness have been grown with excellent interface quality and thickness uniformity comparable to molecular beam or vapour phase techniques such as MBE or MOVPE. InAs quantum wells were grown closely lattice-matched to InAsSbP quaternary alloy confining layers having a much wider energy bandgap (0.5eV). These quantum wells embedded between proper lattice-matched confining layers with a wider bandgap form the key element of a promising structure for the fabrication of mid-infrared LEDs and lasers based on InAs quantum wells. Some basic characteristics of the kinetics of InAs heteroepitaxy on InAsSbP quaternary surfaces are reported and the extent to which the main experimental parameters control the resulting layer thickness is determined.

U2 - 10.1049/ip-opt:19982309

DO - 10.1049/ip-opt:19982309

M3 - Journal article

VL - 145

SP - 297

EP - 301

JO - IEE Proceedings - Optoelectronics

JF - IEE Proceedings - Optoelectronics

SN - 1350-2433

IS - 5

ER -