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Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSN › Conference contribution/Paper › peer-review
Research output: Contribution in Book/Report/Proceedings - With ISBN/ISSN › Conference contribution/Paper › peer-review
}
TY - GEN
T1 - Submillimetre rectangular waveguides based on SU-8 photoresist micromachining technology
AU - Glynn, David
AU - He, Tianhao
AU - Powell, Jeff
AU - Tian, Yingtao
AU - Shang, Xiaobang
AU - Lancaster, Michael J.
N1 - ©2016 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
PY - 2016/10/4
Y1 - 2016/10/4
N2 - Rectangular waveguides are fundamental structures for the transmission of signals at millimetre and submillimetre wavelengths. This paper describes the design and measured results for two rectangular waveguides based on layered SU-8 photoresist micromachining technology, with double-layer fabrication techniques to minimise the air gaps between layers. A brief description of the SU-8 photoresist micromachining procedure is given in the paper. One waveguide is demonstrated for the WR-3 band from 220 GHz to 325 GHz the other is for the WR-6 band 120 GHz to 170 GHz both are made of layered SU-8 with a 3 piece construction. Both waveguides have novel bends in order to connect to the measurement apparatus. The measured performance is presented and compared to conventional machined metal waveguide structures. The measured insertion loss for the SU-8 waveguides in both bands is better than 0.03 dB/mm.
AB - Rectangular waveguides are fundamental structures for the transmission of signals at millimetre and submillimetre wavelengths. This paper describes the design and measured results for two rectangular waveguides based on layered SU-8 photoresist micromachining technology, with double-layer fabrication techniques to minimise the air gaps between layers. A brief description of the SU-8 photoresist micromachining procedure is given in the paper. One waveguide is demonstrated for the WR-3 band from 220 GHz to 325 GHz the other is for the WR-6 band 120 GHz to 170 GHz both are made of layered SU-8 with a 3 piece construction. Both waveguides have novel bends in order to connect to the measurement apparatus. The measured performance is presented and compared to conventional machined metal waveguide structures. The measured insertion loss for the SU-8 waveguides in both bands is better than 0.03 dB/mm.
U2 - 10.1109/EuMC.2016.7824601
DO - 10.1109/EuMC.2016.7824601
M3 - Conference contribution/Paper
SN - 9781509015146
SP - 1346
EP - 1349
BT - Microwave Conference (EuMC), 2016 46th European
PB - IEEE
ER -