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Surface passivation of random alloy AlGaAsSb avalanche photodiode

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Surface passivation of random alloy AlGaAsSb avalanche photodiode. / Cao, Peng; Peng, Hongling; Wang, Tiancai et al.
In: Electronics Letters, Vol. 59, No. 18, e12956, 30.09.2023.

Research output: Contribution to Journal/MagazineJournal articlepeer-review

Harvard

Cao, P, Peng, H, Wang, T, Srivastava, V, Kesaria, M, You, M, Zhuang, Q & Zheng, W 2023, 'Surface passivation of random alloy AlGaAsSb avalanche photodiode', Electronics Letters, vol. 59, no. 18, e12956. https://doi.org/10.1049/ell2.12956

APA

Cao, P., Peng, H., Wang, T., Srivastava, V., Kesaria, M., You, M., Zhuang, Q., & Zheng, W. (2023). Surface passivation of random alloy AlGaAsSb avalanche photodiode. Electronics Letters, 59(18), Article e12956. https://doi.org/10.1049/ell2.12956

Vancouver

Cao P, Peng H, Wang T, Srivastava V, Kesaria M, You M et al. Surface passivation of random alloy AlGaAsSb avalanche photodiode. Electronics Letters. 2023 Sept 30;59(18):e12956. Epub 2023 Sept 24. doi: 10.1049/ell2.12956

Author

Cao, Peng ; Peng, Hongling ; Wang, Tiancai et al. / Surface passivation of random alloy AlGaAsSb avalanche photodiode. In: Electronics Letters. 2023 ; Vol. 59, No. 18.

Bibtex

@article{385543e3f9324b4990957b5dca94f446,
title = "Surface passivation of random alloy AlGaAsSb avalanche photodiode",
abstract = "AlGaAsSb attracts significant interest for near‐infrared avalanche photodiodes (APD). The authors report a two‐order reduction in the dark current and a six‐time enhancement of gain in random alloy (RA) AlGaAsSb APD that is surface passivated by conformal coating of Al2O3 via atomic layer deposition (ALD). The dark currents of the APDs with 400‐µm diameter (dry etched) at 90% breakdown voltage (0.9 Vbr) are (5.5 ± 0.5) × 10−5 A, (2.1 ± 0.4) × 10−5 A, and (6.2 ± 0.8) × 10−7 A for non‐passivated, Si3N4 passivated, and Al2O3 passivated devices, respectively. The dark current at a gain of 10 for the Al2O3 passivated device is 1 × 10−8 A which is comparable to the reported value for 100‐µm diameter mesa diodes passivated by SU‐8. Maximum gain values of 6, 12, and 35 were obtained for non‐passivated, Si3N4 passivated, and Al2O3 passivated devices, respectively. Moreover, punch‐through capacitance of 8 pF in a spectral response of 450 to 850 nm was obtained. Thus, Al2O3 passivation can be the best solution for antimonide optoelectronic devices.",
keywords = "passivation, avalanche photodiodes",
author = "Peng Cao and Hongling Peng and Tiancai Wang and Vibha Srivastava and Manoj Kesaria and Minghui You and Qiandong Zhuang and Wanhua Zheng",
year = "2023",
month = sep,
day = "30",
doi = "10.1049/ell2.12956",
language = "English",
volume = "59",
journal = "Electronics Letters",
issn = "0013-5194",
publisher = "Institution of Engineering and Technology",
number = "18",

}

RIS

TY - JOUR

T1 - Surface passivation of random alloy AlGaAsSb avalanche photodiode

AU - Cao, Peng

AU - Peng, Hongling

AU - Wang, Tiancai

AU - Srivastava, Vibha

AU - Kesaria, Manoj

AU - You, Minghui

AU - Zhuang, Qiandong

AU - Zheng, Wanhua

PY - 2023/9/30

Y1 - 2023/9/30

N2 - AlGaAsSb attracts significant interest for near‐infrared avalanche photodiodes (APD). The authors report a two‐order reduction in the dark current and a six‐time enhancement of gain in random alloy (RA) AlGaAsSb APD that is surface passivated by conformal coating of Al2O3 via atomic layer deposition (ALD). The dark currents of the APDs with 400‐µm diameter (dry etched) at 90% breakdown voltage (0.9 Vbr) are (5.5 ± 0.5) × 10−5 A, (2.1 ± 0.4) × 10−5 A, and (6.2 ± 0.8) × 10−7 A for non‐passivated, Si3N4 passivated, and Al2O3 passivated devices, respectively. The dark current at a gain of 10 for the Al2O3 passivated device is 1 × 10−8 A which is comparable to the reported value for 100‐µm diameter mesa diodes passivated by SU‐8. Maximum gain values of 6, 12, and 35 were obtained for non‐passivated, Si3N4 passivated, and Al2O3 passivated devices, respectively. Moreover, punch‐through capacitance of 8 pF in a spectral response of 450 to 850 nm was obtained. Thus, Al2O3 passivation can be the best solution for antimonide optoelectronic devices.

AB - AlGaAsSb attracts significant interest for near‐infrared avalanche photodiodes (APD). The authors report a two‐order reduction in the dark current and a six‐time enhancement of gain in random alloy (RA) AlGaAsSb APD that is surface passivated by conformal coating of Al2O3 via atomic layer deposition (ALD). The dark currents of the APDs with 400‐µm diameter (dry etched) at 90% breakdown voltage (0.9 Vbr) are (5.5 ± 0.5) × 10−5 A, (2.1 ± 0.4) × 10−5 A, and (6.2 ± 0.8) × 10−7 A for non‐passivated, Si3N4 passivated, and Al2O3 passivated devices, respectively. The dark current at a gain of 10 for the Al2O3 passivated device is 1 × 10−8 A which is comparable to the reported value for 100‐µm diameter mesa diodes passivated by SU‐8. Maximum gain values of 6, 12, and 35 were obtained for non‐passivated, Si3N4 passivated, and Al2O3 passivated devices, respectively. Moreover, punch‐through capacitance of 8 pF in a spectral response of 450 to 850 nm was obtained. Thus, Al2O3 passivation can be the best solution for antimonide optoelectronic devices.

KW - passivation

KW - avalanche photodiodes

U2 - 10.1049/ell2.12956

DO - 10.1049/ell2.12956

M3 - Journal article

VL - 59

JO - Electronics Letters

JF - Electronics Letters

SN - 0013-5194

IS - 18

M1 - e12956

ER -