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UV-LIGA Microfabrication of 0.3 THz Double Corrugated Waveguide

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Abstract

A microfabrication process has been developed by using ultraviolet photolithography (UV-LIGA) with multi-layer SU-8 photoresist to create high aspect ratio Slow Wave Structures (SWS) for millimeter waves and THz vacuum electron devices. The main steps of the process will be described, applied to the fabrication of a double corrugated waveguide at 300 GHz.