12,000

We have over 12,000 students, from over 100 countries, within one of the safest campuses in the UK

93%

93% of Lancaster students go into work or further study within six months of graduating

Home > Research > Publications & Outputs > A Versatile Nanopatterning Technique Based on C...
View graph of relations

« Back

A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff

Research output: Contribution to journalJournal article

Published

  • Mark C. Rosamond
  • Andrew J. Gallant
  • Michael C. Petty
  • Oleg Kolosov
  • Dagou A. Zeze
Journal publication date16/11/2011
JournalAdvanced Materials
Journal number43
Volume23
Number of pages6
Pages5039-5044
Original languageEnglish

Abstract

A new low-cost top-down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift-off) and can create 100-nm sized structures over wafer-sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof-of-concept experiment is also described for the fabrication of gold-nanowire transparent conducting electrodes, which show excellent optoelectronic properties.