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A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff

Research output: Contribution to Journal/MagazineJournal articlepeer-review

  • Mark C. Rosamond
  • Andrew J. Gallant
  • Michael C. Petty
  • Oleg Kolosov
  • Dagou A. Zeze
<mark>Journal publication date</mark>16/11/2011
<mark>Journal</mark>Advanced Materials
Issue number43
Number of pages6
Pages (from-to)5039-5044
Publication StatusPublished
<mark>Original language</mark>English


A new low-cost top-down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift-off) and can create 100-nm sized structures over wafer-sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof-of-concept experiment is also described for the fabrication of gold-nanowire transparent conducting electrodes, which show excellent optoelectronic properties.