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A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff

Research output: Contribution to Journal/Magazine › Journal article › peer-review

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A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff. / Rosamond, Mark C.; Gallant, Andrew J.; Petty, Michael C. et al.
In: Advanced Materials, Vol. 23, No. 43, 16.11.2011, p. 5039-5044.

Research output: Contribution to Journal/Magazine › Journal article › peer-review

Harvard

Rosamond, MC, Gallant, AJ, Petty, MC, Kolosov, O & Zeze, DA 2011, 'A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff', Advanced Materials, vol. 23, no. 43, pp. 5039-5044. https://doi.org/10.1002/adma.201102708

APA

Rosamond, M. C., Gallant, A. J., Petty, M. C., Kolosov, O., & Zeze, D. A. (2011). A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff. Advanced Materials, 23(43), 5039-5044. https://doi.org/10.1002/adma.201102708

Vancouver

Rosamond MC, Gallant AJ, Petty MC, Kolosov O, Zeze DA. A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff. Advanced Materials. 2011 Nov 16;23(43):5039-5044. doi: 10.1002/adma.201102708

Author

Rosamond, Mark C. ; Gallant, Andrew J. ; Petty, Michael C. et al. / A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff. In: Advanced Materials. 2011 ; Vol. 23, No. 43. pp. 5039-5044.

Bibtex

@article{cb36b8794a0644929b46ea5c72904559,
title = "A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff",
abstract = "A new low-cost top-down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift-off) and can create 100-nm sized structures over wafer-sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof-of-concept experiment is also described for the fabrication of gold-nanowire transparent conducting electrodes, which show excellent optoelectronic properties.",
keywords = "patterning, nanolithography , nanowires , transparent conductive electrodes",
author = "Rosamond, {Mark C.} and Gallant, {Andrew J.} and Petty, {Michael C.} and Oleg Kolosov and Zeze, {Dagou A.}",
year = "2011",
month = nov,
day = "16",
doi = "10.1002/adma.201102708",
language = "English",
volume = "23",
pages = "5039--5044",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "43",

}

RIS

TY - JOUR

T1 - A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff

AU - Rosamond, Mark C.

AU - Gallant, Andrew J.

AU - Petty, Michael C.

AU - Kolosov, Oleg

AU - Zeze, Dagou A.

PY - 2011/11/16

Y1 - 2011/11/16

N2 - A new low-cost top-down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift-off) and can create 100-nm sized structures over wafer-sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof-of-concept experiment is also described for the fabrication of gold-nanowire transparent conducting electrodes, which show excellent optoelectronic properties.

AB - A new low-cost top-down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift-off) and can create 100-nm sized structures over wafer-sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof-of-concept experiment is also described for the fabrication of gold-nanowire transparent conducting electrodes, which show excellent optoelectronic properties.

KW - patterning

KW - nanolithography

KW - nanowires

KW - transparent conductive electrodes

UR - http://www.scopus.com/inward/record.url?scp=81255201085&partnerID=8YFLogxK

U2 - 10.1002/adma.201102708

DO - 10.1002/adma.201102708

M3 - Journal article

VL - 23

SP - 5039

EP - 5044

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 43

ER -