Rights statement: © 2006 The American Physical Society
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Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
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TY - JOUR
T1 - Angular dependence of domain wall resistivity in artificial magnetic domain structures
AU - Aziz, A.
AU - Bending, S. J.
AU - Roberts, H. G.
AU - Crampin, S.
AU - Heard, P. J.
AU - Marrows, C. H.
N1 - © 2006 The American Physical Society
PY - 2006/11/17
Y1 - 2006/11/17
N2 - We exploit the ability to precisely control the magnetic domain structure of perpendicularly magnetized Pt/Co/Pt trilayers to fabricate artificial domain wall arrays and study their transport properties. The scaling behavior of this model system confirms the intrinsic domain wall origin of the magnetoresistance, and systematic studies using domains patterned at various angles to the current flow are excellently described by an angular-dependent resistivity tensor containing perpendicular and parallel domain wall resistivities. We find that the latter are fully consistent with Levy-Zhang theory, which allows us to estimate the ratio of minority to majority spin carrier resistivities, rho(down arrow)/rho(up arrow)similar to 5.5, in good agreement with thin film band structure calculations.
AB - We exploit the ability to precisely control the magnetic domain structure of perpendicularly magnetized Pt/Co/Pt trilayers to fabricate artificial domain wall arrays and study their transport properties. The scaling behavior of this model system confirms the intrinsic domain wall origin of the magnetoresistance, and systematic studies using domains patterned at various angles to the current flow are excellently described by an angular-dependent resistivity tensor containing perpendicular and parallel domain wall resistivities. We find that the latter are fully consistent with Levy-Zhang theory, which allows us to estimate the ratio of minority to majority spin carrier resistivities, rho(down arrow)/rho(up arrow)similar to 5.5, in good agreement with thin film band structure calculations.
KW - SCATTERING
KW - THIN-FILMS
KW - MAGNETORESISTANCE
KW - FERROMAGNETS
KW - RESISTANCE
KW - ANISOTROPY
KW - ORIGIN
U2 - 10.1103/PhysRevLett.97.206602
DO - 10.1103/PhysRevLett.97.206602
M3 - Journal article
VL - 97
JO - Physical review letters
JF - Physical review letters
SN - 0031-9007
IS - 20
M1 - 206602
ER -