Research output: Contribution to Journal/Magazine › Journal article › peer-review
Research output: Contribution to Journal/Magazine › Journal article › peer-review
}
TY - JOUR
T1 - GaAs and AlGaAs APDs with GaSb absorption regions in a separate absorption and multiplication structure using a hetero-lattice interface
AU - Marshall, Andrew
AU - Craig, Adam
AU - Reyner, Charles J.
AU - Huffaker, Diana L.
PY - 2015/5
Y1 - 2015/5
N2 - Interfacial misfit (IMF) arrays were used to create two APD structures, allowing GaSb absorption layers to be combined with wide-gap multiplication regions, grown using GaAs and Al0.8Ga0.2As, respectively. The GaAs APD represents a proof-of-principle, which is developed in the Al0.8Ga0.2As APD to achieve reduced dark currents, of 5.07 μA cm−2 at 90% of the breakdown voltage, and values for effective k = β/α below 0.2. A random-path-length (RPL) simulation was used to model the excess noise in both structures, taking into account the effects of dead space. It is envisaged that the GaSb absorption regions could be replaced with other materials from the 6.1 Å family, allowing for long-wavelength APDs with reduced dark currents and excess noise.
AB - Interfacial misfit (IMF) arrays were used to create two APD structures, allowing GaSb absorption layers to be combined with wide-gap multiplication regions, grown using GaAs and Al0.8Ga0.2As, respectively. The GaAs APD represents a proof-of-principle, which is developed in the Al0.8Ga0.2As APD to achieve reduced dark currents, of 5.07 μA cm−2 at 90% of the breakdown voltage, and values for effective k = β/α below 0.2. A random-path-length (RPL) simulation was used to model the excess noise in both structures, taking into account the effects of dead space. It is envisaged that the GaSb absorption regions could be replaced with other materials from the 6.1 Å family, allowing for long-wavelength APDs with reduced dark currents and excess noise.
KW - Avalanche photodiode
KW - Interface misfit epitaxy
KW - Excess noise
KW - Random path length model
U2 - 10.1016/j.infrared.2014.08.014
DO - 10.1016/j.infrared.2014.08.014
M3 - Journal article
VL - 70
SP - 168
EP - 170
JO - Infrared Physics and Technology
JF - Infrared Physics and Technology
SN - 1350-4495
ER -