Rights statement: D. E. Presnov, A. A. Dorofeev, I. V. Bozhev, A. S. Trifonov, S. G. Kafanov, Yu. A. Pashkin, V. A. Krupenin, "Silicon nanobridge as a high quality mechanical resonator," Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110220V (15 March 2019) Copyright notice format: Copyright 2019 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. DOI abstract link format: http://dx.doi.org/10.1117/12.2521034
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Final published version
Research output: Contribution to Journal/Magazine › Journal article › peer-review
| <mark>Journal publication date</mark> | 15/03/2019 |
|---|---|
| <mark>Journal</mark> | Proceedings of SPIE |
| Volume | 11022 |
| Number of pages | 7 |
| Publication Status | Published |
| <mark>Original language</mark> | English |
| Event | International Conference on Micro- and Nano-Electronics 2018, ICMNE 2018 - Zvenigorod, Russian Federation Duration: 1/10/2018 → 5/10/2018 |
| Conference | International Conference on Micro- and Nano-Electronics 2018, ICMNE 2018 |
|---|---|
| Country/Territory | Russian Federation |
| City | Zvenigorod |
| Period | 1/10/18 → 5/10/18 |
The paper presents details of the fabricating technology of nanoscale mechanical resonators based on suspended silicon nanowires. The structures were made from silicon on insulator material, the thickness of the upper layer of silicon is 110 nm, the thickness of silicon oxide is 200 nm. Fabrication process contains standard CMOS compatible technologies only: Electron lithography with positive resist, reactive ion and liquid etching, electron beam deposition of thin films. The presented structures can be used as sensors of mass, displacement, acceleration, pressure with extremely high sensitivity.