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Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method

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Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method. / Ftouni, Hossein; Blanc, Christophe; Sikora, A. et al.
In: Journal of Physics: Conference Series, Vol. 395, 012109, 2012.

Research output: Contribution to Journal/Magazine › Journal article › peer-review

Harvard

Ftouni, H, Blanc, C, Sikora, A, Richard, J, Defoort, M, Lulla , K, Collin, E & Bourgeois, O 2012, 'Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method', Journal of Physics: Conference Series, vol. 395, 012109. https://doi.org/10.1088/1742-6596/395/1/012109

APA

Ftouni, H., Blanc, C., Sikora, A., Richard, J., Defoort, M., Lulla , K., Collin, E., & Bourgeois, O. (2012). Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method. Journal of Physics: Conference Series, 395, Article 012109. https://doi.org/10.1088/1742-6596/395/1/012109

Vancouver

Ftouni H, Blanc C, Sikora A, Richard J, Defoort M, Lulla K et al. Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method. Journal of Physics: Conference Series. 2012;395:012109. doi: 10.1088/1742-6596/395/1/012109

Author

Ftouni, Hossein ; Blanc, Christophe ; Sikora, A. et al. / Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method. In: Journal of Physics: Conference Series. 2012 ; Vol. 395.

Bibtex

@article{b03691ee18654de4b850235314ea898a,
title = "Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-V{\"o}lklein method",
abstract = "The thermal properties of suspended thin films prepared by the micro-machining process have been measured using the 3ω dynamic method coupled to a V{\"o}lklein geometry. A transducer (heater/thermometer) centered on the membrane is driven by an ac current causing periodic thermal oscillations. The measurement of the temperature oscillation on the membrane is made at the third harmonic using a Wheatstone bridge set up. Here by coupling the 3ω method to a V{\"o}lklein geometry (suspended membrane) we obtained a highly sensitive technique to measure the thermal conductance with a resolution of (ΔK/K = 10−3) and a sensitivity of the order of nanoWatt/K, thanks to a very sensitive niobium nitride thermometry. This method is applied to measure the in-plane thermal conductivity of 100 nm silicon nitride membrane, in the temperature range of 10–275 K.",
author = "Hossein Ftouni and Christophe Blanc and A. Sikora and J. Richard and M. Defoort and Kunal Lulla and Eddy Collin and Olivier Bourgeois",
year = "2012",
doi = "10.1088/1742-6596/395/1/012109",
language = "English",
volume = "395",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",

}

RIS

TY - JOUR

T1 - Thermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method

AU - Ftouni, Hossein

AU - Blanc, Christophe

AU - Sikora, A.

AU - Richard, J.

AU - Defoort, M.

AU - Lulla , Kunal

AU - Collin, Eddy

AU - Bourgeois, Olivier

PY - 2012

Y1 - 2012

N2 - The thermal properties of suspended thin films prepared by the micro-machining process have been measured using the 3ω dynamic method coupled to a Völklein geometry. A transducer (heater/thermometer) centered on the membrane is driven by an ac current causing periodic thermal oscillations. The measurement of the temperature oscillation on the membrane is made at the third harmonic using a Wheatstone bridge set up. Here by coupling the 3ω method to a Völklein geometry (suspended membrane) we obtained a highly sensitive technique to measure the thermal conductance with a resolution of (ΔK/K = 10−3) and a sensitivity of the order of nanoWatt/K, thanks to a very sensitive niobium nitride thermometry. This method is applied to measure the in-plane thermal conductivity of 100 nm silicon nitride membrane, in the temperature range of 10–275 K.

AB - The thermal properties of suspended thin films prepared by the micro-machining process have been measured using the 3ω dynamic method coupled to a Völklein geometry. A transducer (heater/thermometer) centered on the membrane is driven by an ac current causing periodic thermal oscillations. The measurement of the temperature oscillation on the membrane is made at the third harmonic using a Wheatstone bridge set up. Here by coupling the 3ω method to a Völklein geometry (suspended membrane) we obtained a highly sensitive technique to measure the thermal conductance with a resolution of (ΔK/K = 10−3) and a sensitivity of the order of nanoWatt/K, thanks to a very sensitive niobium nitride thermometry. This method is applied to measure the in-plane thermal conductivity of 100 nm silicon nitride membrane, in the temperature range of 10–275 K.

U2 - 10.1088/1742-6596/395/1/012109

DO - 10.1088/1742-6596/395/1/012109

M3 - Journal article

VL - 395

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

M1 - 012109

ER -