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The stability and degradation of PECVD fluoropolymer nanofilms

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Ellipsometry detailing film thickness and AFM scans of surface topography of PECVD fluoropolymer thin films created using C4F8 as a precursor gas. Heat cycling data and plasma etch rates also included
Date made available15/08/2018
PublisherLancaster University
Date of data production15/08/2018

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